Invention Application
- Patent Title: COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
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Application No.: US15595030Application Date: 2017-05-15
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Publication No.: US20170248847A1Publication Date: 2017-08-31
- Inventor: Hiroyuki KOMATSU , Takehiko NARUOKA , Shinya MINEGISHI , Kaori SAKAI , Tomoki NAGAI
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2014-087752 20140421
- Main IPC: G03F7/038
- IPC: G03F7/038 ; H01L21/311 ; G03F7/039 ; G03F7/004 ; C09D153/00 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; G03F7/11 ; H01L21/027 ; G03F7/16

Abstract:
A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. AB)n (1)
Public/Granted literature
- US10146130B2 Composition for base, and directed self-assembly lithography method Public/Granted day:2018-12-04
Information query
IPC分类: