Invention Application
- Patent Title: PELLICLE FOR RETICLE AND MULTILAYER MIRROR
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Application No.: US15974661Application Date: 2018-05-08
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Publication No.: US20180259846A1Publication Date: 2018-09-13
- Inventor: Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
- Applicant: ASML NETHERLANDS B.V.
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03B27/54 ; G02B5/20 ; G02B27/00 ; C01B32/20 ; G03F7/20 ; H01B1/24 ; H01B1/04 ; G21K1/06 ; G03F1/24 ; G02B5/08 ; B82Y40/00 ; B82Y10/00 ; G03F1/62
Abstract:
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Public/Granted literature
- US10481510B2 Graphene spectral purity filter Public/Granted day:2019-11-19
Information query
