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公开(公告)号：US20170017150A1
公开(公告)日：2017-01-19
申请号：US15281056
申请日：2016-09-29
发明人： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
摘要翻译： 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。
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公开(公告)号：US20180259846A1
公开(公告)日：2018-09-13
申请号：US15974661
申请日：2018-05-08
发明人： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
IPC分类号： G03F1/64 , G03B27/54 , G02B5/20 , G02B27/00 , C01B32/20 , G03F7/20 , H01B1/24 , H01B1/04 , G21K1/06 , G03F1/24 , G02B5/08 , B82Y40/00 , B82Y10/00 , G03F1/62
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
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公开(公告)号：US20160012929A1
公开(公告)日：2016-01-14
申请号：US14765367
申请日：2014-01-14
发明人： Alexey Sergeevich KUZNETSOV , Arjen BOOGAARD , Jeroen Marcel HUIJBREGTSE , Andrey NIKIPELOV , Maarten VAN KAMPEN
CPC分类号： G21K1/062 , B82Y10/00 , C23C28/34 , G03F1/24 , G03F7/70033 , G21K2201/067 , H05G2/008
摘要： A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.
摘要翻译： 一种制造多层反射镜的方法，其包括第一材料和硅的交替层对的多层堆叠，所述方法包括沉积所述第一材料和硅层的交替层对，所述堆叠为 由衬底支撑并且用掺杂剂材料掺杂至少第一材料的第一层。
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公开(公告)号：US20210079519A1
公开(公告)日：2021-03-18
申请号：US16971012
申请日：2019-02-21
发明人： Pieter Willem Herman DE JAGER , Sander Frederik WUISTER , Marie-Claire VAN LARE , Ruben Cornelis MAAS , Alexey Olegovich POLYAKOV , Tamara DRUZHININA , Victoria VORONINA , Evgenia KURGANOVA , Jim Vincent OVERKAMP , Bernardo KASTRUP , Maarten VAN KAMPEN , Alexandr DOLGOV
IPC分类号： C23C16/04 , C23C16/455 , C23C16/48
摘要： Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.
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公开(公告)号：US20180307146A1
公开(公告)日：2018-10-25
申请号：US15766225
申请日：2016-10-25
发明人： Hendrikus Gijsbertus SCHIMMEL , Jeroen Marcel HUIJBREGTSE , Maarten VAN KAMPEN , Pieter-Jan VAN ZWOL
CPC分类号： G03F7/70883 , G03F7/70033 , G03F7/70908 , G03F7/70925 , G21K1/062 , H05G2/00 , H05G2/001 , H05G2/005 , H05G2/008
摘要： A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.32
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