发明申请
- 专利标题： Mask Assembly
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申请号： US15526654申请日： 2015-11-16
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公开(公告)号： US20180329314A1公开(公告)日： 2018-11-15
- 发明人: Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François Sylvain Virgile VAN LOO , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
- 申请人： ASML NETHERLANDS B.V.
- 国际申请： PCT/EP2015/076687 WO 20151116
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F1/64 ; G03F1/22
摘要：
A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
公开/授权文献
- US10558129B2 Mask assembly 公开/授权日：2020-02-11
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