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公开(公告)号：US20170031250A1
公开(公告)日：2017-02-02
申请号：US15293009
申请日：2016-10-13
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US20160377996A1
公开(公告)日：2016-12-29
申请号：US15039795
申请日：2014-11-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Peter Paul HEMPENIUS , Martijn HOUBEN , Nicolaas Rudolf KEMPER , Robertus Mathijs Gerardus RIJS , Paul Corné Henri DE WIT , Stijn Willem BOERE , Youssef Karel Maria DE VOS , Frits VAN DER MEULEN
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
Abstract translation: 光刻设备包括：可在至少一个方向上移动的物体; 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; 以及设置有流体的导管，其中所述导管以图案布置在所述物体上或所述物体中，并且其中所述图案使得所述物体在所述至少一个方向上的加速度沿着所述流体沿着所述流体的加速度压力分布 导管，加速度压力分布不符合共振压力分布，其对应于在感兴趣的频率范围内的共振频率的流体中的驻波模式。
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公开(公告)号：US20210356875A1
公开(公告)日：2021-11-18
申请号：US17282029
申请日：2019-09-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Joost DE HOOGH , Alain Louis Claude LEROUX , Alexander Marinus Arnoldus HUIJBERTS , Christiaan Louis VALENTIN , Robert Coenraad WIT , Dries Vaast Paul HEMSCHOOTE , Frits VAN DER MEULEN , Johannes Franciscus Martinus VAN SANTVOORT , Radu DONOSE
Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.
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公开(公告)号：US20200096882A1
公开(公告)日：2020-03-26
申请号：US16687535
申请日：2019-11-18
Applicant: ASML Netherlands B.V.
Inventor： Frits VAN DER MEULEN , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Jeroen DEKKERS , Paul JANSSEN , Ronald Harm Gunther KRAMER , Matthias KRUIZINGA , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Erik Roelof LOOPSTRA , Gerrit VAN DEN BOSCH , Jérôme François Sylvain Virgile VAN LOO , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE , Angelo Cesar Peter DE KLERK , Jacobus Maria DINGS , Maurice Leonardus Johannes JANSSEN , Roland Jacobus Johannes KERSTENS , Martinus Jozef Maria KESTERS , Michel LOOS , Geert MIDDEL , Silvester Matheus REIJNDERS , Frank Johannes Christiaan THEUERZEIT , Anne Johannes Wilhelmus VAN LIEVENOOGEN
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US20200057394A1
公开(公告)日：2020-02-20
申请号：US16587483
申请日：2019-09-30
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François SylvainVirgile VAN LOO , Beatrijs Louis Marie-Joseph Katrien VERBRUGGE
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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Patent Agency Ranking
公开(公告)号：US20190227445A1
公开(公告)日：2019-07-25
申请号：US16326948
申请日：2017-08-11
Applicant: ASML Netherlands B.V.
Inventor： Frits VAN DER MEULEN , Erik Johan ARLEMARK , Hendrikus Herman Marie COX , Martinus Agnes Willem CUIJPERS , Joost DE HOOGH , Gosse Charles DE VRIES , Paul Comé Henri DE WIT , Sander Catharina Reinier DERKS , Ronald Comelis Gerardus GIJZEN , Dries Vaast Paul HEMSCHOOTE , Christiaan Alexander HOOGENDAM , Adrianus Hendrik KOEVOETS , Raymond Wilhelmus Louis LAFARRE , Alain Louis Claude LEROUX , Patrick Willem Paul LIMPENS , Jim Vincent OVERKAMP , Christiaan Louis VALENTIN , Koos VAN BERKEL , Stan Henricus VAN DER MEULEN , Jacobus Comelis Gerardus VAN DER SANDEN , Harmen Klaas VAN DER SCHOOT , David Ferdinand VLES , Evert Auke Rinze WESTERHUIS
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US20190187573A1
公开(公告)日：2019-06-20
申请号：US16326410
申请日：2017-07-28
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Herman Marie COX , Paul Corné Henri DE WIT , Arie Jeffrey DEN BOEF , Adrianus Hendrik KOEVOETS , Jim Vincent OVERKAMP , Frits VAN DER MEULEN , Jacobus Cornelis Gerardus VAN DER SANDEN
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70433 , G03F7/70625 , G03F7/70783
Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
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公开(公告)号：US20170357165A1
公开(公告)日：2017-12-14
申请号：US15687938
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjored Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20160299440A1
公开(公告)日：2016-10-13
申请号：US15184770
申请日：2016-06-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20250021022A1
公开(公告)日：2025-01-16
申请号：US18682883
申请日：2021-07-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Tiannan GUAN , Zhuangxiong HUANG , Johannes Bernardus Charles ENGELEN , Günes NAKIBOGLU , Matthias KRUIZINGA , Petrus Jacobus Maria VAN GILS , Aldo TRALLI , Sjoerd Frans DE VRIES , Marcel Maria Cornelius Franciscus TEUNISSEN , Richard Joseph BRULS , Frits VAN DER MEULEN
IPC: G03F7/00
Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.
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