公开(公告)号：US20200096882A1

公开(公告)日：2020-03-26

申请号：US16687535

申请日：2019-11-18

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Ronald Harm Gunther KRAMER ,  Matthias KRUIZINGA ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Erik Roelof LOOPSTRA ,  Gerrit VAN DEN BOSCH ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE ,  Angelo Cesar Peter DE KLERK ,  Jacobus Maria DINGS ,  Maurice Leonardus Johannes JANSSEN ,  Roland Jacobus Johannes KERSTENS ,  Martinus Jozef Maria KESTERS ,  Michel LOOS ,  Geert MIDDEL ,  Silvester Matheus REIJNDERS ,  Frank Johannes Christiaan THEUERZEIT ,  Anne Johannes Wilhelmus VAN LIEVENOOGEN

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20180314164A1

公开(公告)日：2018-11-01

申请号：US15523938

申请日：2015-11-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen DEKKERS ,  Han-Kwang NIENHUYS ,  Michael Jozef Mathijs RENKENS ,  Johannes Antonius Gerardus AKKERMANS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA

IPC: G03F7/20 ,  G02B5/18 ,  G02B26/00

CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B5/1838 ,  G02B5/1861 ,  G02B6/29314 ,  G02B26/004 ,  G03F7/70266 ,  G03F7/70308

Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

公开(公告)号：US20180329314A1

公开(公告)日：2018-11-15

申请号：US15526654

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

CPC classification number: G03F7/70983 ,  G03F1/22 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20200057394A1

公开(公告)日：2020-02-20

申请号：US16587483

申请日：2019-09-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François SylvainVirgile VAN LOO ,  Beatrijs Louis Marie-Joseph Katrien VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.