公开(公告)号：US20180329314A1

公开(公告)日：2018-11-15

申请号：US15526654

申请日：2015-11-16

申请人： ASML NETHERLANDS B.V.

发明人： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François Sylvain Virgile VAN LOO ,  Beatrijs Louise Marie-Joseph Katrien VERBRUGGE

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

CPC分类号： G03F7/70983 ,  G03F1/22 ,  G03F1/64 ,  G03F7/70825

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20200057394A1

公开(公告)日：2020-02-20

申请号：US16587483

申请日：2019-09-30

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Matthias KRUIZINGA ,  Maarten Mathijs Marinus JANSEN ,  Jorge Manuel AZEREDO LIMA ,  Erik Willem BOGAART ,  Derk Servatius Gertruda BROUNS ,  Marc BRUIJN ,  Richard Joseph BRULS ,  Jeroen DEKKERS ,  Paul JANSSEN ,  Mohammad Reza KAMALI ,  Ronald Harm Gunther KRAMER ,  Robert Gabriël Maria LANSBERGEN ,  Martinus Hendrikus Antonius LEENDERS ,  Matthew LIPSON ,  Erik Roelof LOOPSTRA ,  Joseph H. LYONS ,  Stephen ROUX ,  Gerrit VAN DEN BOSCH ,  Sander VAN DEN HEIJKANT ,  Sandra VAN DER GRAAF ,  Frits VAN DER MEULEN ,  Jérôme François SylvainVirgile VAN LOO ,  Beatrijs Louis Marie-Joseph Katrien VERBRUGGE

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.