Invention Application
- Patent Title: HARDMASK COMPOSITION, METHOD OF FORMING PATTERN USING HARDMASK COMPOSITION, AND HARDMASK FORMED FROM HARDMASK COMPOSITION
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Application No.: US15944920Application Date: 2018-04-04
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Publication No.: US20190016906A1Publication Date: 2019-01-17
- Inventor: Minsu SEOL , Sangwon KIM , Hyeonjin SHIN , Dongwook LEE , Seongjun PARK , Yunseong LEE , Seongjun JEONG , Alum JUNG
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2017-0089674 20170714; KR10-2018-0032717 20180321
- Main IPC: C09D7/63
- IPC: C09D7/63 ; C07F3/02 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/32 ; H01L21/311 ; H01L21/3213
Abstract:
Provided are a hardmask composition including a structure represented by Formula 1 and a solvent, a method of forming a pattern using the hardmask composition, and a hardmask formed from the hardmask composition. wherein in Formula 1, R1 to R8, X, and M are described in detail in the detailed description.
Public/Granted literature
Information query
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