- 专利标题: VERTICAL FIELD EFFECT TRANSISTORS INCORPORATING U-SHAPED SEMICONDUCTOR BODIES AND METHODS
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申请号: US15920748申请日: 2018-03-14
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公开(公告)号: US20190287863A1公开(公告)日: 2019-09-19
- 发明人: Ruilong Xie , Lars Liebmann , Edward J. Nowak , Julien Frougier , Jia Zeng
- 申请人: GLOBALFOUNDRIES INC.
- 申请人地址: KY GRAND CAYMAN
- 专利权人: GLOBALFOUNDRIES INC.
- 当前专利权人: GLOBALFOUNDRIES INC.
- 当前专利权人地址: KY GRAND CAYMAN
- 主分类号: H01L21/8238
- IPC分类号: H01L21/8238 ; H01L27/092 ; H01L29/08 ; H01L29/10 ; H01L29/423 ; H01L29/78 ; H01L21/311 ; H01L21/3105 ; H01L21/02
摘要:
Disclosed is a semiconductor structure that includes a vertical field effect transistor (VFET) with a U-shaped semiconductor body. The semiconductor structure can be a standard VFET or a feedback VFET. In either case, the VFET includes a lower source/drain region, a semiconductor body on the lower source/drain region, and an upper source/drain region on the top of the semiconductor body. Rather than having an elongated fin shape, the semiconductor body folds back on itself in the Z direction so as to be essentially U-shaped (as viewed from above). Using a U-shaped semiconductor body reduces the dimension of the VFET in the Z direction without reducing the end-to-end length of the semiconductor body. Thus, VFET cell height can be reduced without reducing device drive current or violating critical design rules. Also disclosed is a method of forming a semiconductor structure that includes such a VFET with a U-shaped semiconductor body.
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