Invention Application
- Patent Title: RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
-
Application No.: US17081000Application Date: 2020-10-27
-
Publication No.: US20210124263A1Publication Date: 2021-04-29
- Inventor: Katsuaki NISHIKORI , Kazuya KIRIYAMA , Takuhiro TANIGUCHI , Ken MARUYAMA
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2019-195559 20191028,JP2020-173561 20201014
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; C08F220/18 ; C07D317/70 ; C07C381/12 ; C07C309/17 ; C07D327/04 ; C07C309/12 ; C07C65/10 ; C07C59/115 ; C07C69/63 ; C07C65/05

Abstract:
A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.
Public/Granted literature
- US11609495B2 Radiation-sensitive resin composition and resist pattern-forming method Public/Granted day:2023-03-21
Information query
IPC分类: