Invention Application
- Patent Title: Systems and Methods for Spin Process Video Analysis During Substrate Processing
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Application No.: US17037142Application Date: 2020-09-29
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Publication No.: US20210129166A1Publication Date: 2021-05-06
- Inventor: Michael Carcasi , Joshua Hooge , Mark Somervell , Hiroyuki Iwaki , Masahide Tadokoro , Masashi Enomoto , Joel Estrella , Yuichiro Kunugimoto
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: B05B12/08
- IPC: B05B12/08 ; G01N21/95 ; H01L21/67 ; H01L21/66

Abstract:
In a liquid dispense system, camera images may be utilized to identify puddle edges of a liquid dispensed on a substrate. The camera image may be used to determine the percentage of puddle coverage and puddling non-idealities. The camera within a fluid dispense system may also be utilized to monitor the intensity of wavelengths reflected from a substrate during a spin coating step. The reflected intensity as a function of time as a substrate is spin coated may be used to monitor and characterize a spin coating process. The reflected intensity as a function of time may be compared to other substrates to identify substrate to substrate film thickness variations. The analysis may be based upon peaks and/or troughs of the reflected intensity as a function of time.
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