- 专利标题: COMPUTATIONAL METROLOGY
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申请号: US17197167申请日: 2021-03-10
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公开(公告)号: US20210191278A1公开(公告)日: 2021-06-24
- 发明人: Wim Tjibbo TEL , Bart Peter Bert SEGERS , Everhardus Cornelis MOS , Emil Peter SCHMITT-WEAVER , Yichen ZHANG , Petrus Gerardus VAN RHEE , Xing Lan LIU , Maria KILITZIRAKI , Reiner Maria JUNGBLUT , Hyunwoo YU
- 申请人: ASML NETHERLANDS B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G06N3/02
摘要:
A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.
公开/授权文献
- US11347150B2 Computational metrology 公开/授权日:2022-05-31
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