公开(公告)号：US20210191278A1

公开(公告)日：2021-06-24

申请号：US17197167

申请日：2021-03-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Bart Peter Bert SEGERS ,  Everhardus Cornelis MOS ,  Emil Peter SCHMITT-WEAVER ,  Yichen ZHANG ,  Petrus Gerardus VAN RHEE ,  Xing Lan LIU ,  Maria KILITZIRAKI ,  Reiner Maria JUNGBLUT ,  Hyunwoo YU

IPC: G03F7/20 ,  G06N3/02

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.

公开(公告)号：US20220260925A1

公开(公告)日：2022-08-18

申请号：US17738093

申请日：2022-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo TEL ,  Bart Peter Bert SEGERS ,  Everhardus Cornelis MOS ,  Emil Peter SCHMITT-WEAVER ,  Yichen ZHANG ,  Petrus Gerardus VAN RHEE ,  Xing Lan LIU ,  Maria KILITZIRAKI ,  Reiner Maria JUNGBLUT ,  Hyunwoo YU

IPC: G03F7/20 ,  G06N3/02

Abstract: A method, involving determining a first distribution of a first parameter associated with an error or residual in performing a device manufacturing process; determining a second distribution of a second parameter associated with an error or residual in performing the device manufacturing process; and determining a distribution of a parameter of interest associated with the device manufacturing process using a function operating on the first and second distributions. The function may include a correlation.