Invention Application
- Patent Title: METHODS FOR REFLECTOR FILM GROWTH
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Application No.: US16819023Application Date: 2020-03-13
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Publication No.: US20210288086A1Publication Date: 2021-09-16
- Inventor: Luping Li , Jacqueline S. Wrench , Wen Ting Chen , Yixiong Yang , In Seok Hwang , Shih Chung Chen , Srinivas Gandikota
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L27/146
- IPC: H01L27/146 ; C23C16/455 ; C23C16/20 ; C23C16/14
Abstract:
Methods and apparatus for forming reflector films are described A liner is formed on a substrate surface followed by formation of the reflector layer so that there is no oxygen exposure between liner and reflector layer formation. In some embodiments, a high aspect ratio structure is filled with a reflector material by partially filling the structure with the reflector material while growth is inhibited at a top portion of the structure, reactivating the top portion of the substrate and then filling the structure with the reflector material.
Public/Granted literature
- US11776980B2 Methods for reflector film growth Public/Granted day:2023-10-03
Information query
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