Invention Application
- Patent Title: COMPOSITION FOR DISSOLVING ABRASIVE PARTICLES AND CLEANING METHOD USING THE SAME
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Application No.: US17516668Application Date: 2021-11-01
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Publication No.: US20220145216A1Publication Date: 2022-05-12
- Inventor: Kyong Jin JUNG , Ga Young JUNG , Young Ho YUN , Kun Hee PARK , Young Gon KIM , Yong Ho JEONG
- Applicant: KCTECH CO., LTD.
- Applicant Address: KR Anseong-si
- Assignee: KCTECH CO., LTD.
- Current Assignee: KCTECH CO., LTD.
- Current Assignee Address: KR Anseong-si
- Priority: KR10-2020-0147813 20201106
- Main IPC: C11D1/14
- IPC: C11D1/14 ; C09K3/14 ; C09G1/02 ; C11D11/00 ; C11D1/00

Abstract:
A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60° C. for 15 minutes may be in a range of −80 to −99.
Public/Granted literature
- US12091636B2 Composition for dissolving abrasive particles and cleaning method using the same Public/Granted day:2024-09-17
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