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公开(公告)号:US20220145216A1
公开(公告)日:2022-05-12
申请号:US17516668
申请日:2021-11-01
Applicant: KCTECH CO., LTD.
Inventor: Kyong Jin JUNG , Ga Young JUNG , Young Ho YUN , Kun Hee PARK , Young Gon KIM , Yong Ho JEONG
Abstract: A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60° C. for 15 minutes may be in a range of −80 to −99.
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公开(公告)号:US20220056373A1
公开(公告)日:2022-02-24
申请号:US17416420
申请日:2019-08-07
Applicant: KCTECH CO., LTD.
Inventor: Ga Young JUNG , Yong Ho JEONG , Kun Hee PARK , Young Gon KIM , Young Ho YOON , Young Lok YOON
Abstract: The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.
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