- 专利标题: POLISHING COMPOSITION
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申请号: US17442712申请日: 2020-03-25
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公开(公告)号: US20220186078A1公开(公告)日: 2022-06-16
- 发明人: Kohsuke TSUCHIYA , Maki ASADA , Taiki ICHITSUBO
- 申请人: FUJIMI INCORPORATED
- 申请人地址: JP Kiyosu-shi, Aichi
- 专利权人: FUJIMI INCORPORATED
- 当前专利权人: FUJIMI INCORPORATED
- 当前专利权人地址: JP Kiyosu-shi, Aichi
- 优先权: JP2019-063741 20190328
- 国际申请: PCT/JP2020/013389 WO 20200325
- 主分类号: C09G1/02
- IPC分类号: C09G1/02 ; C09K3/14
摘要:
Provided is a polishing composition having excellent capability of reducing haze on the surface of an object to be polished. The polishing composition provided by the present invention includes an abrasive, a basic compound, a water-soluble polymer, and water. The water-soluble polymer includes at least a water-soluble polymer P1 and a water-soluble polymer P2. Here, the water-soluble polymer P1 is an acetalized polyvinyl alcohol-based polymer, and the water-soluble polymer P2 is a water-soluble polymer other than the acetalized polyvinyl alcohol-based polymer.
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