Invention Application
- Patent Title: ETCHING COMPOSITION FOR THIN FILM CONTAINING SILVER, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME
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Application No.: US17388712Application Date: 2021-07-29
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Publication No.: US20220204846A1Publication Date: 2022-06-30
- Inventor: JONGHEE PARK , HYOUNG SIK KIM , O Byoung Kwon , Gi-Yong Nam , Kyungchan Min , SUCK JUN LEE , YOUNGMIN KIM , JINHYUNG KIM , DONGHUN LEE , KYU-HUN LIM , DONGMIN JANG
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-Si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-Si
- Priority: KR10-2020-0185187 20201228
- Main IPC: C09K13/06
- IPC: C09K13/06 ; C23F1/44 ; C23F1/02 ; H01L51/00
Abstract:
An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.
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