- 专利标题: SUBSTRATE HAVING ONE OR MORE ELECTRICAL INTERCONNECTS
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申请号: US17855040申请日: 2022-06-30
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公开(公告)号: US20240006298A1公开(公告)日: 2024-01-04
- 发明人: Suddhasattwa Nad , Steve Cho , Marcel Arlan Wall , Onur Ozkan , Ali Lehaf , Yi Yang , Jason Scott Steill , Gang Duan , Brandon C. Marin , Jeremy D. Ecton , Srinivas Venkata Ramanuja Pietambaram , Haifa Hariri , Bai Nie , Hiroki Tanaka , Kyle Mcelhinny , Jason Gamba , Venkata Rajesh Saranam , Kristof Darmawikarta , Haobo Chen
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L21/48
摘要:
An electronic device may include an integrated circuit, for instance a semiconductor die. The electronic device may include a substrate having a first layer and a second layer. The first and second layers may include interconnects recessed below a surface of the substrate. The substrate may include a passivation layer directly coupled with portions of the interconnects. A solder resist material may at least partially cover portions of the passivation layer directly coupled with the first interconnect surface.
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