发明授权
- 专利标题: Buried channel charge coupled device
- 专利标题(中): 埋地通道电荷耦合器件
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申请号: US910343申请日: 1986-09-19
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公开(公告)号: US4694476A公开(公告)日: 1987-09-15
- 发明人: Eiji Oda
- 申请人: Eiji Oda
- 申请人地址: JPX Tokyo
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX59-116073 19840606
- 主分类号: G11C19/28
- IPC分类号: G11C19/28 ; H01L21/339 ; H01L27/14 ; H01L27/148 ; H01L29/76 ; H01L29/762 ; H01L29/768 ; H01L29/772 ; H04N5/335 ; H04N5/341 ; H04N5/359 ; H04N5/372 ; H01L29/78 ; H01L31/00
摘要:
A buried channel CCD is described wherein buried CCD elements are formed on a semiconductor substrate of P-type material and formed in a semiconductor area of N-type material. Transfer electrodes are provided to which a driving pulse is applied. The driving pulse is a three-level pulse having, at different time points, first, second and third levels, during at least one part of a time period in a charge transfer period and a charge integration period, the first or second level of the three-level pulse is applied to selected transfer electrodes so that part of signal charges in the buried channel are drained through the semiconductor area into the semiconductor substrate; and in the charge transfer period, the second and third levels are alternately applied to the transfer electrodes.
公开/授权文献
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