发明授权
- 专利标题： Antireflective coating for photoresist compositions
- 专利标题（中）： 用于光致抗蚀剂组合物的抗反射涂层
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申请号： US724109申请日： 1996-09-30
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公开(公告)号： US5733714A公开(公告)日： 1998-03-31
- 发明人: Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
- 申请人： Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
- 申请人地址： VGX
- 专利权人： Clariant Finance (BVI) Limited
- 当前专利权人： Clariant Finance (BVI) Limited
- 当前专利权人地址： VGX
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C08F16/26 ; C08F18/04 ; C08F20/30 ; C08F20/58 ; C08F26/06 ; G03C1/835 ; G03F7/09 ; G03F7/11 ; H01L21/027 ; G03C5/00 ; C03F8/30
摘要：
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
公开/授权文献
- US5140764A Non-blocking microfilm jacket 公开/授权日：1992-08-25
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