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49 条记录 (耗时 0.045 秒)

    Positive photoresists containing novel photoactive compounds
    6.
    发明授权
    Positive photoresists containing novel photoactive compounds 失效
    含有新型光活性化合物的正性光致抗蚀剂

    公开(公告)号：US5876897A

    公开(公告)日：1999-03-02

    申请号：US812542

    申请日：1997-03-07

    申请人： Dana L. Durham ,  Ping-Hung Lu ,  Joseph E. Oberlander ,  Dinesh N. Khanna

    发明人： Dana L. Durham ,  Ping-Hung Lu ,  Joseph E. Oberlander ,  Dinesh N. Khanna

    IPC分类号： C08K5/00 ,  C08L61/06 ,  C08L101/12 ,  G03F7/004 ,  G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/022

    摘要： A light sensitive positive composition comprising an alkali soluble resin, a novel photoactive compound represented by the structure ##STR1## where, X is O, S or N--R', where R' is H, alkyl, substituted alkyl, aryl or aralkyl,Y is a connecting group such as SO.sub.2, CO, O or NR',Z is a carbon containing organic ballast moiety having a molecular weight greater than about 75 and can form a bond with the connecting group,R is independently H, alkyl, alkoxy, aryl, aralkyl, halo or fluoroalkyl,m=1-3, and n.gtoreq.1;and a solvent or mixture of solvents. The invention further comprises a process for imaging the composition of this invention to give positive image. The light sensitive composition is especially useful as a positive deep-uv photoresist.

    摘要翻译： 一种光敏正性组合物，其包含碱溶性树脂，由结构表示的新型光敏化合物，其中X为O，S或N-R'，其中R'为H，烷基，取代的烷基，芳基或芳烷基， Y是连接基团，例如SO 2，CO，O或NR'，Z是分子量大于约75的含碳有机镇流器部分，可与连接基团形成键，R独立地为H，烷基，烷氧基 ，芳基，芳烷基，卤代或氟烷基，m = 1-3，n≥1; 和溶剂或溶剂混合物。 本发明还包括用于对本发明的组合物进行成像以给出正像的方法。 光敏组合物特别适用于正深紫外光致抗蚀剂。

    Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
    8.
    发明授权
    Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride 失效
    使用苯并内酯环化合物和重氮磺酰氯的重氮酯制造正性光致抗蚀剂图像的方法

    公开(公告)号：US5348842A

    公开(公告)日：1994-09-20

    申请号：US42362

    申请日：1993-04-02

    申请人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    发明人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    IPC分类号： G03F7/022 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

    CPC分类号： G03F7/022 ,  Y10S430/168

    摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on benzolactone ring has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

    摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中至少一个苯甲酸内酯环上的羟基已经被重氮化磺酰氯酯化，重氮磺酰氯由60至100摩尔％ 4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

    Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
    9.
    发明授权
    Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester 失效
    苯并内酯环化合物的重氮酯和使用重氮酯的正性光致抗蚀剂组合物和元素

    公开(公告)号：US5221592A

    公开(公告)日：1993-06-22

    申请号：US847527

    申请日：1992-03-06

    申请人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    发明人： Dinesh N. Khanna ,  Douglas McKenzie ,  Chester J. Sobodacha ,  Ralph R. Dammel

    IPC分类号： G03F7/022

    CPC分类号： G03F7/022 ,  Y10S430/168

    摘要： A photosensitizer comprising a diazo ester of benzolactone ring compound, such as phenolphthalein or cresolphthalein as the backbone, where at least one of the hydroxy groups on the benzolactone ring compound has been esterified with diazo-sulfonyl chloride consisting of 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride or a mixture thereof, and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition and a suitable solvent.

    摘要翻译： 一种光敏剂，其包含苯并内酯环化合物的重氮酯，例如酚酞或甲酚酞作为主链，其中苯并内酯环化合物上的至少一个羟基已用由60至100摩尔％2的重氮磺酰氯酯化， 1,4或2,1,5-重氮磺酰氯或其混合物，以及光致抗蚀剂，其包含光致抗蚀剂组合物中以足以使光致抗蚀剂组合物均匀光敏的量的光敏剂的混合物; 水不溶性的碱溶性酚醛清漆树脂，酚醛清漆树脂以足以形成基本均匀的光致抗蚀剂组合物和合适溶剂的量存在于光致抗蚀剂组合物中。

    Composition for stripping photoresist and organic materials from substrate surfaces
    10.
    发明授权
    Composition for stripping photoresist and organic materials from substrate surfaces 失效
    用于从基材表面剥离光致抗蚀剂和有机材料的组合物

    公开(公告)号：US06368421B1

    公开(公告)日：2002-04-09

    申请号：US09113892

    申请日：1998-07-10

    申请人： Joseph E. Oberlander ,  Mark S. Slezak ,  Dinesh N. Khanna ,  Dana L. Durham ,  Lawrence F. Spinicelli

    发明人： Joseph E. Oberlander ,  Mark S. Slezak ,  Dinesh N. Khanna ,  Dana L. Durham ,  Lawrence F. Spinicelli

    IPC分类号： B08B304

    CPC分类号： G03F7/426

    摘要： The invention relates to the field of microelectronics, such as integrated circuits, and more particularly to compositions and methods of removing photoresists or other organic materials from the surfaces of substrates used in the fabrication of integrated circuits. In particular the present invention relates to amine-free stripping compositions comprising solvent and surfactant that can effectively remove organic materials without corroding the underlying substrate, and the invention also relates to methods for removing these organic materials with the novel stripping composition.

    摘要翻译： 本发明涉及微电子学领域，例如集成电路，更具体地涉及从用于制造集成电路的衬底表面去除光致抗蚀剂或其它有机材料的组合物和方法。 特别地，本发明涉及不含无溶剂和表面活性剂的无胺汽提组合物，其可有效去除有机材料而不腐蚀下面的基底，本发明还涉及用新的汽提组合物除去这些有机材料的方法。