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公开(公告)号:US5733714A
公开(公告)日:1998-03-31
申请号:US724109
申请日:1996-09-30
申请人: Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
发明人: Iain McCulloch , Ralph R. Dammel , Anthony J. Corso , Shuji Ding , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna
IPC分类号: G03F7/004 , C08F16/26 , C08F18/04 , C08F20/30 , C08F20/58 , C08F26/06 , G03C1/835 , G03F7/09 , G03F7/11 , H01L21/027 , G03C5/00 , C03F8/30
CPC分类号: G03C1/835 , G03F7/091 , Y10S430/151
摘要: The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
摘要翻译: 本发明涉及一种新颖的抗反射涂层溶液及其在光刻中的应用。 抗反射涂层溶液包括新型聚合物和有机溶剂或有机溶剂的混合物,其中新型聚合物包含含有吸收约180nm至约450nm的染料的单元和含有交联基团的单元。