发明授权
- 专利标题: Electroplating device, and process for electroplating work using the device
- 专利标题(中): 电镀装置,以及使用该装置的电镀工作
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申请号: US10028359申请日: 2001-12-28
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公开(公告)号: US06923898B2公开(公告)日: 2005-08-02
- 发明人: Kohshi Yoshimura , Takeshi Nishiuchi , Fumiaki Kikui , Masahiro Asano , Takahiro Isozaki
- 申请人: Kohshi Yoshimura , Takeshi Nishiuchi , Fumiaki Kikui , Masahiro Asano , Takahiro Isozaki
- 申请人地址: JP Osaka-fu
- 专利权人: Neomax Co., Ltd.
- 当前专利权人: Neomax Co., Ltd.
- 当前专利权人地址: JP Osaka-fu
- 代理机构: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP
- 优先权: JP11-187325 19990701; JP2000-174537 20000609
- 主分类号: C25D7/00
- IPC分类号: C25D7/00 ; C25D3/00 ; C25D7/04 ; C25D17/12 ; C25D17/16 ; C25D21/00 ; C25D21/10 ; H01F7/02 ; H01F41/02 ; H02K1/17 ; H02K1/27 ; H02K15/03 ; C25D5/02 ; C25D5/00 ; H01F7/06
摘要:
An electroplating device including an anode inserted through and disposed in a hole provided in a work and communicating with the outside, and a member for rotating the work about its center axis and supplying a plating electric current to the work. Alternatively, a separate member may supply the plating electric current to the work. A plating solution in the hole in the work may be allowed to flow. Thus, a uniform plated film can be formed on both of the outer and inner surfaces of the work having the communicating with the outside such as a ring-shaped work, of which a ring-shaped bonded magnet is representative, by using the electroplating device.
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