Invention Grant
- Patent Title: Ozone processing apparatus and ozone processing method
- Patent Title (中): 臭氧处理装置和臭氧处理方法
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Application No.: US10581729Application Date: 2004-12-16
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Publication No.: US07767006B2Publication Date: 2010-08-03
- Inventor: Yoshichika Tokuno , Norihiro Ito , Takehiko Orii , Mitsunori Nakamori , Tadashi Iino , Hiroki Ohno , Yusuke Saito
- Applicant: Yoshichika Tokuno , Norihiro Ito , Takehiko Orii , Mitsunori Nakamori , Tadashi Iino , Hiroki Ohno , Yusuke Saito
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Morrison & Foerster LLP
- Priority: JP2003-419044 20031217; JP2004-167081 20040604; JP2004-167082 20040604
- International Application: PCT/JP2004/018791 WO 20041216
- International Announcement: WO2005/058753 WO 20050630
- Main IPC: B01D59/26
- IPC: B01D59/26

Abstract:
Water vapor is mixed to O3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O3 gas from the condensed water. Water vapor is mixed with the O3 gas again. The mixed fluid passes through a metal trap composed of a container containing plural silicon chips as a metal adsorbent, thereby to remove the remaining metals therefrom.
Public/Granted literature
- US20070107751A1 Ozone processing apparatus and ozone processing method Public/Granted day:2007-05-17
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