公开(公告)号：US20070107751A1

公开(公告)日：2007-05-17

申请号：US10581729

申请日：2004-12-16

申请人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

发明人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

IPC分类号： B08B7/04 ,  C23G1/00 ,  B08B3/00

CPC分类号： H01L21/68721 ,  B01D53/002 ,  B01D2257/106 ,  C01B13/10 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： Water vapor is mixed to O3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O3 gas from the condensed water. Water vapor is mixed with the O3 gas again. The mixed fluid passes through a metal trap composed of a container containing plural silicon chips as a metal adsorbent, thereby to remove the remaining metals therefrom.

摘要翻译： 将水蒸汽与由放电型臭氧发生器产生的O 3气体混合。 混合流体由冷却器冷却，由此含有的O 3 3气体中的杂质如金属和氮氧化物溶解在冷凝水中。 随后，气液分离器从冷凝水中分离出O 3 N 3气体。 水蒸汽再次与O 3 3气体混合。 混合流体通过金属捕集器，该金属捕集器由含有多个硅芯片的容器组成，作为金属吸附剂，从而从其中除去剩余的金属。

公开(公告)号：US07767006B2

公开(公告)日：2010-08-03

申请号：US10581729

申请日：2004-12-16

申请人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

发明人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

IPC分类号： B01D59/26

CPC分类号： H01L21/68721 ,  B01D53/002 ,  B01D2257/106 ,  C01B13/10 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： Water vapor is mixed to O3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O3 gas from the condensed water. Water vapor is mixed with the O3 gas again. The mixed fluid passes through a metal trap composed of a container containing plural silicon chips as a metal adsorbent, thereby to remove the remaining metals therefrom.

摘要翻译： 将水蒸气与由排放型臭氧发生器产生的O 3气体混合。 混合流体被冷却器冷却，从而O 3气体中所含的金属和氮氧化物等杂质溶解在冷凝水中。 随后，气液分离器将O 3气体与冷凝水分离。 水蒸汽再次与O3气体混合。 混合流体通过金属捕集器，该金属捕集器由含有多个硅芯片的容器组成，作为金属吸附剂，从而从其中除去剩余的金属。

公开(公告)号：US07731799B2

公开(公告)日：2010-06-08

申请号：US10579423

申请日：2004-12-07

申请人： Takayuki Toshima ,  Tadashi Iino ,  Yusuke Saito ,  Mitsunori Nakamori ,  Noritaka Uchida ,  Takehiko Orii

发明人： Takayuki Toshima ,  Tadashi Iino ,  Yusuke Saito ,  Mitsunori Nakamori ,  Noritaka Uchida ,  Takehiko Orii

IPC分类号： B08B3/08

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist film is altered in a water-soluble state. Thereafter, the ArF resist film is removed from the substrate by feeding pure water to the ArF resist film altered into the water-soluble state.

摘要翻译： 从具有ArF抗蚀剂膜的晶片去除ArF抗蚀剂膜的基板处理方法。 由于在ArF抗蚀剂膜上进行紫外线照射处理，然后向ArF抗蚀剂膜供给臭氧气体和水蒸汽，所以ArF抗蚀剂膜变为水溶性状态。 此后，通过将纯水供给到改变成水溶性状态的ArF抗蚀剂膜，从基板除去ArF抗蚀剂膜。

公开(公告)号：US20070074747A1

公开(公告)日：2007-04-05

申请号：US10579423

申请日：2004-12-07

申请人： Takayuki Toshima ,  Tadashi Iino ,  Yusuke Saito ,  Mitsunori Nakamori ,  Noritaka Uchida ,  Takehiko Orii

发明人： Takayuki Toshima ,  Tadashi Iino ,  Yusuke Saito ,  Mitsunori Nakamori ,  Noritaka Uchida ,  Takehiko Orii

IPC分类号： B08B3/00

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist film is altered in a water-soluble state. Thereafter, the ArF resist film is removed from the substrate by feeding pure water to the ArF resist film altered into the water-soluble state.

摘要翻译： 从具有ArF抗蚀剂膜的晶片去除ArF抗蚀剂膜的基板处理方法。 由于在ArF抗蚀剂膜上进行紫外线照射处理，然后向ArF抗蚀剂膜供给臭氧气体和水蒸汽，所以ArF抗蚀剂膜变为水溶性状态。 此后，通过将纯水供给到改变成水溶性状态的ArF抗蚀剂膜，从基板除去ArF抗蚀剂膜。

公开(公告)号：US07693597B2

公开(公告)日：2010-04-06

申请号：US11244684

申请日：2005-10-05

申请人： Mitsunori Nakamori ,  Tadashi Iino ,  Noritaka Uchida ,  Takehiko Orii

发明人： Mitsunori Nakamori ,  Tadashi Iino ,  Noritaka Uchida ,  Takehiko Orii

IPC分类号： G06F19/00 ,  C25F1/00 ,  C25F3/30 ,  C25F5/00 ,  C23F1/00 ,  H01L21/306 ,  H01L21/44

CPC分类号： G03F7/423 ,  G03F7/42 ,  H01L21/31133 ,  H01L21/67051 ,  H01L21/67178

摘要： A substrate processing method for removing a resist film from a substrate having the resist film formed thereon comprises maintaining the inner region of the chamber at a prescribed temperature by putting a substrate in a chamber, denaturing the resist film by supplying ozone and a water vapor in such a manner that ozone is supplied into the chamber while a water vapor is supplied into the chamber at a prescribed flow rate, the amount of ozone relative to the amount of the water vapor being adjusted such that the dew formation within the chamber is prevented, and processing the substrate with a prescribed liquid material so as to remove the denatured resist film from the substrate.

摘要翻译： 一种用于从其上形成有抗蚀剂膜的基板去除抗蚀剂膜的基板处理方法包括通过将基板放置在室中来将室的内部区域保持在规定温度，通过将臭氧和水蒸气供给而使抗蚀剂膜变性 这样一种方式是将臭氧以规定的流量供给到室中，同时将臭氧量相对于水蒸气量调节到室内的露点形成， 并用规定的液体材料处理基板，以从基板上除去变性的抗蚀剂膜。

公开(公告)号：US20060079096A1

公开(公告)日：2006-04-13

申请号：US11244684

申请日：2005-10-05

申请人： Mitsunori Nakamori ,  Tadashi Iino ,  Noritaka Uchida ,  Takehiko Orii

发明人： Mitsunori Nakamori ,  Tadashi Iino ,  Noritaka Uchida ,  Takehiko Orii

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G03F7/423 ,  G03F7/42 ,  H01L21/31133 ,  H01L21/67051 ,  H01L21/67178

摘要： A substrate processing method for removing a resist film from a substrate having the resist film formed thereon comprises maintaining the inner region of the chamber at a prescribed temperature by putting a substrate in a chamber, denaturing the resist film by supplying ozone and a water vapor in such a manner that ozone is supplied into the chamber while a water vapor is supplied into the chamber at a prescribed flow rate, the amount of ozone relative to the amount of the water vapor being adjusted such that the dew formation within the chamber is prevented, and processing the substrate with a prescribed liquid material so as to remove the denatured resist film from the substrate.

摘要翻译： 一种用于从其上形成有抗蚀剂膜的基板去除抗蚀剂膜的基板处理方法包括通过将基板放置在室中来将室的内部区域保持在规定温度，通过将臭氧和水蒸气供给而使抗蚀剂膜变性 这样一种方式是将臭氧以规定的流量供给到室中，同时将臭氧量相对于水蒸气量调节到室内的露点形成， 并用规定的液体材料处理基板，以从基板上除去变性的抗蚀剂膜。

公开(公告)号：US07691210B2

公开(公告)日：2010-04-06

申请号：US11543819

申请日：2006-10-06

申请人： Takehiko Orii ,  Kenji Sekiguchi ,  Tadashi Iino

发明人： Takehiko Orii ,  Kenji Sekiguchi ,  Tadashi Iino

IPC分类号： B08B3/00

CPC分类号： G03F7/42 ,  G03F7/423

摘要： A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denaturing the resist film and the protection film after causing popping, to be soluble in water; and performing purified water cleaning to remove from the substrate the resist film and the protection film denatured to be soluble in water.

摘要翻译： 用于除去设置在基板上并且在表面上具有固化层的抗蚀剂膜的抗蚀剂膜去除方法包括用保护膜覆盖抗蚀剂膜的表面; 导致用保护膜覆盖的抗蚀剂膜突然出现; 导致抗蚀剂膜和保护膜变质，引起爆裂，溶于水; 并进行净化水清洗，从基板除去抗蚀剂膜和保护膜变性以溶于水。

公开(公告)号：US20070082496A1

公开(公告)日：2007-04-12

申请号：US11543819

申请日：2006-10-06

申请人： Takehiko Orii ,  Kenji Sekiguchi ,  Tadashi Iino

发明人： Takehiko Orii ,  Kenji Sekiguchi ,  Tadashi Iino

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G03F7/42 ,  G03F7/423

摘要： A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denaturing the resist film and the protection film after causing popping, to be soluble in water; and performing purified water cleaning to remove from the substrate the resist film and the protection film denatured to be soluble in water.

摘要翻译： 用于除去设置在基板上并且在表面上具有固化层的抗蚀剂膜的抗蚀剂膜去除方法包括用保护膜覆盖抗蚀剂膜的表面; 导致用保护膜覆盖的抗蚀剂膜突然出现; 导致抗蚀剂膜和保护膜变质，引起爆裂，溶于水; 并进行净化水清洗，从基板除去抗蚀剂膜和保护膜变性以溶于水。

公开(公告)号：US07086410B2

公开(公告)日：2006-08-08

申请号：US10384089

申请日：2003-03-07

申请人： Yasuhiro Chouno ,  Norihiro Ito ,  Keigo Satake ,  Tadashi Iino

发明人： Yasuhiro Chouno ,  Norihiro Ito ,  Keigo Satake ,  Tadashi Iino

IPC分类号： G05D16/20

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10S134/902 ,  Y10S438/935 ,  Y10T137/0396 ,  Y10T137/7761 ,  Y10T137/87917

摘要： A common solvent vapor supply source 41 and a common processing gas supply source 42 supply ozone gas and steam to a plurality of processing vessels 30A, 30B. Pressures in the processing vessels are regulated by adjusting the openings of the valuable throttle valves 50A, 50B, which are placed in exhaust lines 80A, 80B, respectively.

摘要翻译： 常见的溶剂蒸气供给源41和公共处理气体供应源42向多个处理容器30A，30B供应臭氧气体和蒸汽。处理容器中的压力通过调节有价值的节流阀50A的开口来调节 ，50B，它们分别放置在排气管线80A，80B中。

公开(公告)号：US08252484B2

公开(公告)日：2012-08-28

申请号：US12442701

申请日：2007-09-27

申请人： Tadashi Iino ,  Zenichiro Izumi ,  Yukihito Tanaka ,  Toshiki Kawamura

发明人： Tadashi Iino ,  Zenichiro Izumi ,  Yukihito Tanaka ,  Toshiki Kawamura

IPC分类号： H01M4/64

CPC分类号： H01M8/242 ,  H01M8/0213 ,  H01M8/0221 ,  H01M8/0226 ,  H01M8/0228 ,  H01M8/0254 ,  H01M8/026 ,  H01M8/0263 ,  H01M8/0267 ,  H01M8/0273 ,  H01M8/0284 ,  Y02P70/56

摘要： A high-performance separator for a fuel cell is provided that includes an electrically conducting flow path part and an integrated insulating outer circumferential part surrounding the flow path part. The flow path part includes an electrically conducting resin composition including a carbonaceous material (A) and a thermoplastic resin composition (B) at a mass ratio (A)/(B) of 1 to 20 with the total mass of (A) and (B) accounting for 80 to 100 mass % in the composition. The flow path part has a corrugated shape having a recess and a projection on each of front and back surfaces thereof, where the recess constitutes a groove for a flow path, and a thickness of 0.05 to 0.5 mm and a maximum thickness/minimum thickness ratio of 1 to 3. The insulating outer circumferential part includes an insulating thermoplastic resin composition having a volume resistivity of 1010 Ωcm or more.

摘要翻译： 提供一种用于燃料电池的高性能分离器，其包括导电流路部分和围绕流路部分的整体绝缘外周部分。 流路部包括质量比（A）/（B）为1〜20的碳质材料（A）和热塑性树脂组合物（B）的导电性树脂组合物，其总质量为（A）和（A） B）占组合物的80〜100质量％。 流路部具有波纹状，在其前表面和后表面各具有凹部和突起，凹部构成流路用槽，厚度为0.05〜0.5mm，最大厚度/最小厚度比 绝缘外周部分包括体积电阻率为1010Ω·cm以上的绝缘热塑性树脂组合物。