Invention Grant
US09248509B2 Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity 有权
多区域等离子处理静电卡盘具有改善的温度均匀性

Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
Abstract:
An electrostatic chuck assembly including a dielectric layer with a top surface to support a workpiece. A cooling channel base disposed below the dielectric layer includes a plurality of inner fluid conduits disposed beneath an inner portion of the top surface, and a plurality of outer fluid conduits disposed beneath an outer portion of the top surface. A chuck assembly includes a thermal break disposed within the cooling channel base between the inner and outer fluid conduits. A chuck assembly includes a fluid distribution plate disposed below the cooling channel base and the base plate to distribute a heat transfer fluid delivered from a common input to each inner or outer fluid conduit. The branches of the inner input manifold may have substantially equal fluid conductance.
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