Invention Grant
US09281331B2 High dielectric constant structure for the vertical transfer gates of a complementary metal-oxide semiconductor (CMOS) image sensor
有权
用于互补金属氧化物半导体(CMOS)图像传感器的垂直传输门的高介电常数结构
- Patent Title: High dielectric constant structure for the vertical transfer gates of a complementary metal-oxide semiconductor (CMOS) image sensor
- Patent Title (中): 用于互补金属氧化物半导体(CMOS)图像传感器的垂直传输门的高介电常数结构
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Application No.: US14308910Application Date: 2014-06-19
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Publication No.: US09281331B2Publication Date: 2016-03-08
- Inventor: Sheng-Chau Chen , Chih-Yu Lai , Kuo-Ming Wu , Kuo-Hwa Tzeng , Cheng-Hsien Chou , Cheng-Yuan Tsai , Yeur-Luen Tu , Chia-Shiung Tsai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L27/146 ; H01L29/51 ; H01L29/423 ; H01L21/02 ; H01L29/66 ; H01L21/306 ; H01L21/308

Abstract:
A vertical-gate transfer transistor of an active pixel sensor (APS) is provided. The transistor includes a semiconductor substrate, a vertical trench extending into the semiconductor substrate, a dielectric lining the vertical trench, and a vertical gate filling the lined vertical trench. The dielectric includes a dielectric constant exceeding 3.9 (i.e., the dielectric constant of silicon dioxide). A method of manufacturing the vertical-gate transfer transistor, an APS including the vertical-gate transfer transistor, a method of manufacturing the APS, and an image sensor including a plurality of the APSs are also provided.
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