Invention Grant
- Patent Title: Methods for forming vias in glass substrates
- Patent Title (中): 在玻璃基板上形成通孔的方法
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Application No.: US14464851Application Date: 2014-08-21
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Publication No.: US09296646B2Publication Date: 2016-03-29
- Inventor: Robert Carl Burket , Uta-Barbara Goers , Samuel Odei Owusu , Tammy Lynn Petriwsky
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent John T. Haran
- Main IPC: C03C15/00
- IPC: C03C15/00 ; H05K1/03 ; H05K3/00 ; B23K26/00 ; B23K26/36 ; B23K26/38 ; C03C23/00

Abstract:
Methods for forming vias in glass substrates by laser drilling and acid etching are disclosed. In one embodiment, a method forming a via in a glass substrate includes laser drilling the via through at least a portion of a thickness of the glass substrate from an incident surface of the glass substrate. The method further includes etching the glass substrate for an etching duration to increase a diameter of an incident opening of the via and applying ultrasonic energy to the glass substrate during at least a portion of the etching duration. The applied ultrasonic energy has a frequency between 40 kHz and 192 kHz.
Public/Granted literature
- US20150060402A1 METHODS FOR FORMING VIAS IN GLASS SUBSTRATES Public/Granted day:2015-03-05
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