Invention Grant
- Patent Title: Grid for plasma ion implant
- Patent Title (中): 等离子体离子注入网格
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Application No.: US14135519Application Date: 2013-12-19
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Publication No.: US09318332B2Publication Date: 2016-04-19
- Inventor: Vinay Prabhakar , Babak Adibi
- Applicant: Intevac, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: INTEVAC, INC.
- Current Assignee: INTEVAC, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Nixon Peabody LLP
- Agent Joseph Bach, Esq.
- Main IPC: H01L21/425
- IPC: H01L21/425 ; C23C16/00 ; H01L21/266 ; H01L31/068 ; H01L31/18 ; H01L21/426 ; H01J37/32
Abstract:
A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.
Public/Granted literature
- US20140170795A1 GRID FOR PLASMA ION IMPLANT Public/Granted day:2014-06-19
Information query
IPC分类:
