发明授权
- 专利标题： Grid for plasma ion implant
- 专利标题（中）： 等离子体离子注入网格
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申请号： US14135519申请日： 2013-12-19
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公开(公告)号： US09318332B2公开(公告)日： 2016-04-19
- 发明人: Vinay Prabhakar , Babak Adibi
- 申请人： Intevac, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： INTEVAC, INC.
- 当前专利权人： INTEVAC, INC.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Nixon Peabody LLP
- 代理商 Joseph Bach, Esq.
- 主分类号： H01L21/425
- IPC分类号： H01L21/425 ; C23C16/00 ; H01L21/266 ; H01L31/068 ; H01L31/18 ; H01L21/426 ; H01J37/32
摘要：
A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.
公开/授权文献
- US20140170795A1 GRID FOR PLASMA ION IMPLANT 公开/授权日：2014-06-19
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