Invention Grant
- Patent Title: Photoresist composition, method of forming a pattern and method of manufacturing a thin film transistor substrate
- Patent Title (中): 光刻胶组合物，形成图案的方法和制造薄膜晶体管衬底的方法
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Application No.: US14522713Application Date: 2014-10-24
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Publication No.: US09343553B2Publication Date: 2016-05-17
- Inventor: Jung-Soo Lee , Jeong-Min Park , Sung-Kyun Park , Jun Chun , Ki-Hyun Cho , Ji-Hyun Kim , Dong-Min Kim , Seung-Ki Kim , Eun Jeagal
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2014-0007997 20140122
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/075 ; H01L21/311 ; H01L29/66 ; G03F7/022
Abstract:
A photoresist composition, a method of forming a pattern, and a method of manufacturing a thin film transistor substrate, the composition including a solvent, a novolak resin, a diazide-based photo-sensitizer, an acryl compound represented by the following Chemical Formula 1:
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