Invention Grant
- Patent Title: Methods for deposition of materials including mechanical abrasion
- Patent Title (中): 材料沉积方法,包括机械磨损
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Application No.: US13800169Application Date: 2013-03-13
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Publication No.: US09459222B2Publication Date: 2016-10-04
- Inventor: Timothy M. Swager , Katherine A. Mirica , Joseph M. Azzarelli , Jonathan G. Weis , Jan Schnorr , Birgit Esser
- Applicant: Massachusetts Institute of Technology
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: G01N27/00
- IPC: G01N27/00 ; G01N27/04 ; G01N27/07 ; G01N27/12

Abstract:
Methods described herein may be useful in the fabrication and/or screening of devices (e.g., sensors, circuits, etc.) including conductive materials. In some embodiments, a conductive material is formed on a substrate using mechanical abrasion. The methods described herein may be useful in fabricating sensors, circuits, tags for remotely-monitored sensors or human/object labeling and tracking, among other devices. In some cases, devices for determining analytes are also provided.
Public/Granted literature
- US20130330231A1 METHODS FOR DEPOSITION OF MATERIALS INCLUDING MECHANICAL ABRASION Public/Granted day:2013-12-12
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