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US09459222B2 Methods for deposition of materials including mechanical abrasion 有权
材料沉积方法,包括机械磨损

Methods for deposition of materials including mechanical abrasion
Abstract:
Methods described herein may be useful in the fabrication and/or screening of devices (e.g., sensors, circuits, etc.) including conductive materials. In some embodiments, a conductive material is formed on a substrate using mechanical abrasion. The methods described herein may be useful in fabricating sensors, circuits, tags for remotely-monitored sensors or human/object labeling and tracking, among other devices. In some cases, devices for determining analytes are also provided.
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