Invention Grant
US09583369B2 Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
有权
离子辅助沉积在盖子和喷嘴上的稀土氧化物基涂层
- Patent Title: Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
- Patent Title (中): 离子辅助沉积在盖子和喷嘴上的稀土氧化物基涂层
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Application No.: US14034315Application Date: 2013-09-23
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Publication No.: US09583369B2Publication Date: 2017-02-28
- Inventor: Jennifer Y. Sun , Biraja P. Kanungo , Vahid Firouzdor , Ying Zhang
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B65D43/02 ; C23C14/00 ; C23C14/08 ; H01J37/32
Abstract:
A method of manufacturing an article comprises providing a lid or nozzle for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the lid or nozzle, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.
Public/Granted literature
- US20150021324A1 ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS ON LIDS AND NOZZLES Public/Granted day:2015-01-22
Information query
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