Invention Grant
- Patent Title: EFEM
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Application No.: US14569293Application Date: 2014-12-12
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Publication No.: US09704727B2Publication Date: 2017-07-11
- Inventor: Mikio Segawa , Yasushi Taniyama , Mitsuo Natsume , Atsushi Suzuki , Toshihiro Kawai , Kunihiko Sato
- Applicant: SINFONIA TECHNOLOGY CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SINFONIA TECHNOLOGY CO., LTD.
- Current Assignee: SINFONIA TECHNOLOGY CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2013-257817 20131213; JP2013-270967 20131227; JP2014-017820 20140131; JP2014-017821 20140131
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/67

Abstract:
An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31a provided on a wall 31, and connecting a processing apparatus 6; a wafer transport apparatus 2, and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4; a gas delivery port 11; a gas suction port 12; a gas feedback path 10; and a FFU 13 that includes a filter 13b that is provided in the gas delivery port 11, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.
Public/Granted literature
- US20150170945A1 EFEM Public/Granted day:2015-06-18
Information query
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