公开(公告)号：US20190145641A1

公开(公告)日：2019-05-16

申请号：US16244490

申请日：2019-01-10

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Yasushi Taniyama ,  Mitsutoshi Ochiai ,  Mitsuo Natsume ,  Atsushi Suzuki

IPC: F24F9/00 ,  H01L21/677 ,  H01L21/67

Abstract: There is provided a method for manufacturing semiconductor. The method includes providing a semiconductor manufacturing apparatus and providing an EFEM. The EFEM includes a shield gas curtain apparatus 6 that forms a gas curtain capable of shielding an opening 23 when an internal space 5S of a purge container 5, in which the humidity is reduced to a predetermined value by means of a bottom purge apparatus 25 provided in a load port 2, is brought into communication with an internal space 3S of a wafer transport chamber 3, the gas curtain being formed of a shield curtain gas blown immediately downward from a location near the opening 23 of the load port 2 and being closer to the wafer transport chamber 3 than the opening 23 at a higher height than an upper edge of the opening 23.

公开(公告)号：US20150024671A1

公开(公告)日：2015-01-22

申请号：US14269360

申请日：2014-05-05

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Yasushi Taniyama ,  Mitsutoshi Ochiai ,  Mitsuo Natsume ,  Atsushi Suzuki

IPC: F24F9/00

CPC classification number: F24F9/00 ,  F24F3/161 ,  H01L21/67017 ,  H01L21/67772

Abstract: There is provided an EFEM that includes a shield gas curtain apparatus 6 that forms a gas curtain capable of shielding an opening 23 when an internal space 5S of a purge container 5, in which the humidity is reduced to a predetermined value by means of a bottom purge apparatus 25 provided in a load port 2, is brought into communication with an internal space 3S of a wafer transport chamber 3, the gas curtain being formed of a shield curtain gas blown immediately downward from a location near the opening 23 of the load port 2 and being closer to the wafer transport chamber 3 than the opening 23 at a higher height than an upper edge of the opening 23. The EFEM thus configured can prevent and suppress a rapid increase in the humidity in the purge container, in which the humidity in the interior space is reduced by performing the bottom purging, occurring immediately after a lid of the purge container is opened, so that quality degradation due to the moisture adhered on a wafer can be avoided.

Abstract translation: 提供了一种EFEM，其包括屏蔽气幕装置6，其形成能够屏蔽开口23的气幕，当清洗容器5的内部空间5S通过底部将湿度降低到预定值时 设置在负载端口2中的净化装置25与晶片运送室3的内部空间3S连通，气幕由从负载端口的开口23附近的位置立即向下吹出的屏蔽帘式气体形成 并且比开口23更高的高度比开口23更靠近晶片输送室3.如此构造的EFEM可以防止和抑制净化容器中的湿度的快速增加，其中湿度 通过执行底部清洗，在清洗容器的盖子打开之后立即发生的内部空间被减少，使得由于水分附着在晶片上而导致的质量劣化可以是avoi ded。

公开(公告)号：US20230395416A1

公开(公告)日：2023-12-07

申请号：US18205874

申请日：2023-06-05

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Tatsuru Ogawa ,  Yuki Ishihara ,  Shinpei Kogiso ,  Tatsuya Miura ,  Atsushi Suzuki ,  Yuki Matsumoto

IPC: H01L21/677

CPC classification number: H01L21/67775 ,  H01L21/67778 ,  H01L21/67772 ,  H01L21/67793

Abstract: A load port for loading and unloading substrates between a transport chamber and a storage container includes: a plate-like portion constituting a wall surface of the transport chamber and including an opening in communication with an interior of the transport chamber; a stage configured to mount the storage container thereon such that a lid of the storage container faces a door of the opening; and a controller configured to control a driving device that moves the stage forward and rearward with respect to the plate-like portion, wherein the controller is further configured to control, when moving the stage toward the plate-like portion, the driving device to: apply a first thrust directed toward the plate-like portion to the stage until immediately before the stage reaches a predetermined position; and then apply a second thrust, which is greater than the first thrust and directed toward the plate-like portion, to the stage.

公开(公告)号：US09704727B2

公开(公告)日：2017-07-11

申请号：US14569293

申请日：2014-12-12

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Mikio Segawa ,  Yasushi Taniyama ,  Mitsuo Natsume ,  Atsushi Suzuki ,  Toshihiro Kawai ,  Kunihiko Sato

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67017 ,  H01L21/67115 ,  H01L21/67766 ,  H01L21/67772 ,  H01L21/67778

Abstract: An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31a provided on a wall 31, and connecting a processing apparatus 6; a wafer transport apparatus 2, and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4; a gas delivery port 11; a gas suction port 12; a gas feedback path 10; and a FFU 13 that includes a filter 13b that is provided in the gas delivery port 11, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.

公开(公告)号：US20150170945A1

公开(公告)日：2015-06-18

申请号：US14569293

申请日：2014-12-12

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Mikio Segawa ,  Yasushi Taniyama ,  Mitsuo Natsume ,  Atsushi Suzuki ,  Toshihiro Kawai ,  Kunihiko Sato

IPC: H01L21/673 ,  H01L21/677

CPC classification number: H01L21/67017 ,  H01L21/67115 ,  H01L21/67766 ,  H01L21/67772 ,  H01L21/67778

Abstract: An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31a provided on a wall 31, and connecting a processing apparatus 6; a wafer transport apparatus 2, and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4; a gas delivery port 11; a gas suction port 12; a gas feedback path 10; and a FFU 13 that includes a filter 13b that is provided in the gas delivery port 11, and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.

Abstract translation: EFEM包括壳体3，其构成通过将负载端口4连接到设置在壁31上的开口31a而基本上闭合的晶片运送室9，并且连接处理装置6; 晶片传送装置2，并且在处理装置6和安装在装载端口4上的FOUP 7之间传送晶片; 气体输送口11; 气体吸入口12; 气体反馈路径10; 以及FFU13，其包括设置在气体输送口11中的过滤器13b，并且消除了包含在输送气体中的颗粒，其中晶片输送室9中的气体通过在晶片输送室9中产生向下的气流而循环 并且通过气体反馈路径10反馈气体。

公开(公告)号：US20130326841A1

公开(公告)日：2013-12-12

申请号：US13762991

申请日：2013-02-08

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Mitsuo Natsume ,  Atsushi Suzuki

IPC: B08B9/093

CPC classification number: B08B9/093 ,  H01L21/67393 ,  H01L21/67775

Abstract: A purge nozzle unit 1 includes a nozzle main body 2 including a trunk 41 and a collar section 8 protruding outward from the trunk 41 and a holder 3 including a side wall 31 that is in slidable contact with an outward face of the collar section 8 and a bottom wall 33 having a through hole 32 with which an outward face of the trunk 41 is in slidable contact and is configured such that a vent 30 in communication with the outside is formed in the holder 3 and the nozzle main body 2 is vertically moved relative to the holder 3 by regulating a pressure in a pressure-regulated space S formed between the nozzle main body 2 and the holder 3 and in communication with the vent 30.

Abstract translation: 吹扫喷嘴单元1包括喷嘴主体2，喷嘴主体2包括行李箱41和从行李箱41向外突出的轴环部分8以及具有与轴环部分8的外表面可滑动接触的侧壁31的支架3，以及 具有贯通孔32的底壁33，其中躯干41的外表面可与滑动接触并且构造成使得在保持器3中形成与外部连通的通气口30，并且喷嘴主体2垂直移动 通过调节形成在喷嘴主体2和保持器3之间并与通气口30连通的压力调节空间S中的压力来相对于保持器3。

公开(公告)号：US20240145285A1

公开(公告)日：2024-05-02

申请号：US18383938

申请日：2023-10-26

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Tatsuru Ogawa ,  Yuki Ishihara ,  Shinpei Kogiso ,  Atsushi Suzuki ,  Yuki Matsumoto ,  Tatsuya Miura

IPC: H01L21/677

CPC classification number: H01L21/67706 ,  H01L21/67772

Abstract: A load port includes: a plate-shaped base member having an opening via which a transfer target object is loaded and unloaded; a door member capable of opening and closing the opening; a link mechanism including a link member having one end rotatably connected to the door member; a guide roller configured to move together with the door member; a guide surface bent to extend from a first direction to a second direction and configured to guide the guide roller; a drive member to which the other end of the link member is rotatably connected; and a driver configured to move the drive member in the second direction.

公开(公告)号：US20230415936A1

公开(公告)日：2023-12-28

申请号：US18212791

申请日：2023-06-22

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Tatsuya Miura ,  Shinpei Kogiso ,  Yuki Ishihara ,  Tatsuru Ogawa ,  Atsushi Suzuki ,  Yuki Matsumoto

IPC: B65B7/16 ,  B65B69/00

CPC classification number: B65B7/16 ,  B65B69/00

Abstract: A load port connected to a transport part includes: a base constituting a portion of a wall of the transport part; a stage on which a storage container is mounted; a stage driving mechanism configured to move the stage in a direction toward or away from the base; a door configured to be capable of opening/closing an opening of the base at a position facing a lid of the storage container mounted on the stage and to be capable of holding the lid disposed to face the opening in a state of closing the opening; a door driving mechanism configured to move the door between an opening position and a closing position; and a movement restricting part configured to restrict a movement of the stage in the direction away from the base by abutting against the stage.

公开(公告)号：US11658047B2

公开(公告)日：2023-05-23

申请号：US16387792

申请日：2019-04-18

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Atsushi Suzuki ,  Yasushi Taniyama ,  Tomoya Mizutani

IPC: H01L21/67 ,  H01L21/677 ,  B05B1/30 ,  B05B1/00

CPC classification number: H01L21/67017 ,  B05B1/005 ,  B05B1/3013 ,  H01L21/67766 ,  H01L21/67778

Abstract: There is provided an exhaust nozzle unit capable of discharging a gas atmosphere in a substrate storage container having a loading/unloading opening from the container to an outside of the container through a port formed on a bottom surface of the container. The exhausted nozzle includes a nozzle capable of switching the port from a closed state to an open state by pressing a valve of the port; and a housing configured to hold the nozzle so as to be movable up and down between a use posture in which the port is in the open state and a standby posture in which the port is in the closed state.

公开(公告)号：US09174253B2

公开(公告)日：2015-11-03

申请号：US13762991

申请日：2013-02-08

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Mitsuo Natsume ,  Atsushi Suzuki

IPC: B65B1/04 ,  B08B9/093 ,  H01L21/673 ,  H01L21/677

CPC classification number: B08B9/093 ,  H01L21/67393 ,  H01L21/67775

Abstract: A purge nozzle unit 1 includes a nozzle main body 2 including a trunk 41 and a collar section 8 protruding outward from the trunk 41 and a holder 3 including a side wall 31 that is in slidable contact with an outward face of the collar section 8 and a bottom wall 33 having a through hole 32 with which an outward face of the trunk 41 is in slidable contact and is configured such that a vent 30 in communication with the outside is formed in the holder 3 and the nozzle main body 2 is vertically moved relative to the holder 3 by regulating a pressure in a pressure-regulated space S formed between the nozzle main body 2 and the holder 3 and in communication with the vent 30.

Abstract translation: 吹扫喷嘴单元1包括喷嘴主体2，喷嘴主体2包括行李箱41和从行李箱41向外突出的轴环部分8以及具有与轴环部分8的外表面可滑动接触的侧壁31的支架3，以及 具有贯通孔32的底壁33，其中躯干41的外表面可与滑动接触并且构造成使得在保持器3中形成与外部连通的通气口30，并且喷嘴主体2垂直移动 通过调节形成在喷嘴主体2和保持器3之间并与通气口30连通的压力调节空间S中的压力来相对于保持器3。