- 专利标题: Surrounding gate semiconductor device
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申请号: US14755317申请日: 2015-06-30
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公开(公告)号: US09768267B2公开(公告)日: 2017-09-19
- 发明人: Fujio Masuoka , Hiroki Nakamura
- 申请人: Unisantis Electronics Singapore Pte. Ltd.
- 申请人地址: SG Singapore
- 专利权人: UNISANTIS ELECTRONICS SINGAPORE PTE. LTD.
- 当前专利权人: UNISANTIS ELECTRONICS SINGAPORE PTE. LTD.
- 当前专利权人地址: SG Singapore
- 代理机构: Brinks Gilson & Lione
- 主分类号: H01L29/423
- IPC分类号: H01L29/423 ; H01L27/088 ; H01L21/8234 ; H01L21/02 ; H01L21/28 ; H01L21/285 ; H01L21/308 ; H01L21/3105 ; H01L21/311 ; H01L21/321 ; H01L21/3213 ; H01L29/08 ; H01L29/10 ; H01L29/40 ; H01L29/66 ; H01L29/78
摘要:
An SGT is produced by forming a first insulating film around a fin-shaped semiconductor layer, forming a pillar-shaped semiconductor layer in an upper portion of the fin-shaped layer, forming a second insulating film, a polysilicon gate electrode covering the second insulating film, and a polysilicon gate line, forming a diffusion layer in an upper portion of the fin-shaped layer and a lower portion of the pillar-shaped layer, forming a metal-semiconductor compound in an upper portion of the diffusion layer in the fin-shaped layer, depositing an interlayer insulating film, exposing and etching the polysilicon gate electrode and gate line, depositing a first metal, forming a metal gate electrode and a metal gate line, and forming a third metal sidewall on an upper side wall of the pillar-shaped layer. The third metal sidewall is connected to an upper surface of the pillar-shaped layer.