- 专利标题: Localized, in-vacuum modification of small structures
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申请号: US14978180申请日: 2015-12-22
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公开(公告)号: US09812286B2公开(公告)日: 2017-11-07
- 发明人: David H. Narum , Milos Toth , Steven Randolph , Aurelien Philippe Jean Maclou Botman
- 申请人: FEI Company
- 申请人地址: US OR Hillsboro
- 专利权人: FEI Company
- 当前专利权人: FEI Company
- 当前专利权人地址: US OR Hillsboro
- 代理机构: Scheinberg & Associates, P.C.
- 代理商 Michael O. Scheinberg; John E. Hillert
- 主分类号: C25D17/10
- IPC分类号: C25D17/10 ; C25D5/02 ; H01J37/20 ; C25D5/04 ; C25D5/00 ; C25D17/00 ; C25D17/12 ; C25D21/04 ; C25D21/12 ; H01J37/18 ; H01J37/22 ; H01J37/28
摘要:
A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
公开/授权文献
- US20160189920A1 LOCALIZED, IN-VACUUM MODIFICATION OF SMALL STRUCTURES 公开/授权日:2016-06-30
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