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公开(公告)号：US09812286B2
公开(公告)日：2017-11-07
申请号：US14978180
申请日：2015-12-22
Applicant: FEI Company
Inventor： David H. Narum , Milos Toth , Steven Randolph , Aurelien Philippe Jean Maclou Botman
IPC: C25D17/10 , C25D5/02 , H01J37/20 , C25D5/04 , C25D5/00 , C25D17/00 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/22 , H01J37/28
CPC classification number: H01J37/20 , C25D5/003 , C25D5/02 , C25D5/026 , C25D5/04 , C25D17/005 , C25D17/10 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/222 , H01J37/28 , H01J2237/182 , H01J2237/2003 , H01J2237/202 , H01J2237/2801
Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
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公开(公告)号：US20170002467A1
公开(公告)日：2017-01-05
申请号：US15201590
申请日：2016-07-04
Applicant: FEI Company
Inventor： Marcus Straw , Chad Rue , Steven Randolph , Aurelien Philippe Jean Maclou Botman , Clive D. Chandler , Mark W. Utlaut
CPC classification number: C23C16/52 , C23C16/047 , C23C16/4418 , H01J37/3023 , H01J37/3026 , H01J37/304 , H01J37/317 , H01J37/3178 , H01J2237/30416 , H01J2237/30455 , H01J2237/30472 , H01J2237/31735 , H01J2237/31749
Abstract: An improved process control for a charged beam system is provided that allows the capability of accurately producing complex two and three dimensional structures from a computer generated model in a material deposition process. The process control actively monitors the material deposition process and makes corrective adjustments as necessary to produce a pattern or structure that is within an acceptable tolerance range with little or no user intervention. The process control includes a data base containing information directed to properties of a specific pattern or structure and uses an algorithm to instruct the beam system during the material deposition process. Feedback through various means such as image recognition, chamber pressure readings, and EDS signal can be used to instruct the system to make automatic system modifications, such as, beam and gas parameters, or other modifications to the pattern during a material deposition run.
Abstract translation: 提供了一种用于带电束系统的改进的过程控制，其允许在材料沉积过程中从计算机生成的模型精确地产生复杂的二维和三维结构的能力。 过程控制主动监测材料沉积过程，并根据需要进行校正调整，以产生在可接受的公差范围内，甚至无需用户干预的图案或结构。 过程控制包括包含针对特定模式或结构的属性的信息的数据库，并且使用算法在材料沉积过程期间指示束系统。 可以使用诸如图像识别，室压读数和EDS信号的各种手段的反馈来指示系统在材料沉积运行期间进行自动系统修改，例如光束和气体参数或对图案的其它修改。
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公开(公告)号：US09951417B2
公开(公告)日：2018-04-24
申请号：US14507540
申请日：2014-10-06
Applicant: FEI Company
Inventor： Aurélien Philippe Jean Maclou Botman , Steven Randolph , Milos Toth
CPC classification number: C23C16/0263 , C23C16/10 , C23C16/14 , C23C16/4488 , C23C16/48 , C23C16/486 , C23C16/52
Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
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公开(公告)号：US09478390B2
公开(公告)日：2016-10-25
申请号：US14320560
申请日：2014-06-30
Applicant: FEI Company
Inventor： N. William Parker , Marcus Straw , Jorge Filevich , Aurelien Philippe Jean Maclou Botman , Steven Randolph , Clive Chandler , Mark Utlaut
CPC classification number: H01J37/12 , H01J37/228 , H01J2237/006 , H01J2237/31749
Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.
Abstract translation: 一种用于将光或气体或两者引导到位于距离带电粒子束柱的下端约2mm的样本的方法和装置。 带电粒子束柱组件包括限定样品保持位置的平台，并且具有一组静电透镜，每个静电透镜包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。
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公开(公告)号：US20150380205A1
公开(公告)日：2015-12-31
申请号：US14320560
申请日：2014-06-30
Applicant: FEI Company
Inventor： N. William Parker , Mark Straw , Jorge Filevich , Aurelien Philippe Jean Maclou Botman , Steven Randolph , Clive Chandler , Mark Utlaut
IPC: H01J37/12
CPC classification number: H01J37/12 , H01J37/228 , H01J2237/006 , H01J2237/31749
Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.
Abstract translation: 一种用于将光或气体或两者引导到位于距离带电粒子束柱的下端约2mm的样本的方法和装置。带电粒子束柱组件包括限定样本保持位置并具有一组静电透镜的平台 每个包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。
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Patent Agency Ranking
公开(公告)号：US20150099071A1
公开(公告)日：2015-04-09
申请号：US14507540
申请日：2014-10-06
Applicant: FEI Company
Inventor： Aurélien Philippe Jean Maclou Botman , Steven Randolph , Milos Toth
IPC: C23C16/02 , C23C16/52 , C23C16/448 , C23C16/48
CPC classification number: C23C16/0263 , C23C16/10 , C23C16/14 , C23C16/4488 , C23C16/48 , C23C16/486 , C23C16/52
Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.
Abstract translation: 通过在使用光束制备的表面的区域处自发沉积前体气体以提供支持自发反应开始的条件，将材料沉积成所需的图案。 一旦反应开始，它在反应开始的表面的区域没有光束的情况下继续进行。
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公开(公告)号：US20170327951A1
公开(公告)日：2017-11-16
申请号：US15188862
申请日：2016-06-21
Applicant: FEI Company
Inventor： Mehran Kianinia , Olga Shimoni , Igor Aharonovich , Charlene Lobo , Milos Toth , Steven Randolph , Clive D. Chandler
CPC classification number: C23C16/487 , B82Y40/00 , C23C16/56 , G01N33/54353 , H01J37/317 , H01J2237/31732
Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.
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公开(公告)号：US09334568B2
公开(公告)日：2016-05-10
申请号：US14799397
申请日：2015-07-14
Applicant: FEI Company
Inventor： Steven Randolph , Clive D. Chandler
IPC: H05H1/24 , C23C16/48 , C23C16/18 , H01L21/285 , H01L21/768
CPC classification number: C23C16/486 , C23C16/047 , C23C16/18 , C23C16/34 , C23C16/407 , H01J2237/31732 , H01L21/28556 , H01L21/76877 , H01L21/76892
Abstract: An improved method of beam deposition to deposit a low-resistivity metal. Preferred embodiments of the present invention use a novel focused ion beam induced deposition precursor to deposit low-resistivity metallic material such as tin. Applicants have discovered that by using a methylated or ethylated metal such as hexamethylditin as a precursor, material can be deposited having a resistivity as low as 40 μΩ·cm.
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公开(公告)号：US10777383B2
公开(公告)日：2020-09-15
申请号：US16028622
申请日：2018-07-06
Applicant: FEI Company
Inventor： Cameron James Zachreson , Dolf Timmerman , Milos Toth , Jorge Filevich , Steven Randolph , Aurelien Philippe Jean Maclou Botman
Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.
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公开(公告)号：US20160189920A1
公开(公告)日：2016-06-30
申请号：US14978180
申请日：2015-12-22
Applicant: FEI Company
Inventor： David H. Narum , Milos Toth , Steven Randolph , Aurelien Philippe Jean Maclou Botman
CPC classification number: H01J37/20 , C25D5/003 , C25D5/02 , C25D5/026 , C25D5/04 , C25D17/005 , C25D17/10 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/222 , H01J37/28 , H01J2237/182 , H01J2237/2003 , H01J2237/202 , H01J2237/2801
Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
Abstract translation: 电荷转移机构用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改小结构，例如集成电路或微机电系统。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。
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