Invention Grant
- Patent Title: Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
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Application No.: US15142671Application Date: 2016-04-29
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Publication No.: US09964865B2Publication Date: 2018-05-08
- Inventor: Cédric Désiré Grouwstra , Nicolaas Rudolf Kemper , Norbertus Josephus Martinus Van Den Nieuwelaar , Dirk De Vries , Hua Li , Marinus Jochemsen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
Public/Granted literature
- US20160320714A1 METHOD OF ADJUSTING SPEED AND/OR ROUTING OF A TABLE MOVEMENT PLAN AND A LITHOGRAPHIC APPARATUS Public/Granted day:2016-11-03
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