公开(公告)号：US09964865B2

公开(公告)日：2018-05-08

申请号：US15142671

申请日：2016-04-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.