公开(公告)号：US12259664B2

公开(公告)日：2025-03-25

申请号：US17640899

申请日：2020-08-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jigang Ma ,  Hua Li

IPC: H01L23/544 ,  G03F9/00

Abstract: A method of configuring a mark having a trench to be etched into a substrate, the method including: obtaining a relation between an extent of height variation across a surface of a probationary layer deposited on a probationary trench of a probationary depth and a thickness of the probationary layer; determining an extent of height variation across the surface of a layer deposited on the mark allowing a metrology system to determine a position of the mark; and configuring the mark by determining a depth of the trench based on the relation, the extent of height variation and the thickness of a process layer to be deposited on the mark.

公开(公告)号：US09964865B2

公开(公告)日：2018-05-08

申请号：US15142671

申请日：2016-04-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Cédric Désiré Grouwstra ,  Nicolaas Rudolf Kemper ,  Norbertus Josephus Martinus Van Den Nieuwelaar ,  Dirk De Vries ,  Hua Li ,  Marinus Jochemsen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

公开(公告)号：US11360403B2

公开(公告)日：2022-06-14

申请号：US17057619

申请日：2019-05-02

Applicant: ASML Netherlands B.V.

Inventor： Jia Wang ,  Jacob Fredrik Friso Klinkhamer ,  Hua Li

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a bandwidth calculation system for determining a desired wavelength bandwidth for a measurement beam in a mark detection system, the bandwidth calculation system comprising a processing unit configured to determine the desired wavelength bandwidth based on mark geometry information, e.g. comprising mark depth information representing a depth of a mark. In an embodiment the desired wavelength bandwidth is based on a period and/or a variance parameter of a mark detection error function. The invention further relates to a mark detection system, a position measurement system and a lithographic apparatus comprising the bandwidth calculation system, as well as a method for determining a desired wavelength bandwidth.