摘要:
A back-illuminated solid-state imaging device SI includes a semiconductor substrate 1, a shift register 19, and a light-shielding film 57. The semiconductor substrate 1 includes a light incident surface on the back side and a light receiving portion 13 generating a charge in accordance with light incidence. The shift register 19 is disposed on the side of a light-detective surface 7 opposite to the light incident surface of the semiconductor substrate 1. The light-shielding film 57 is disposed on the side of the light-detective surface 7 of the semiconductor substrate 1. The light-shielding film 57 includes an uneven surface 57a opposing the light-detective surface 7.
摘要:
A back-illuminated solid-state imaging device SI includes a semiconductor substrate 1, a shift register 19, and a light-shielding film 57. The semiconductor substrate 1 includes a light incident surface on the back side and a light receiving portion 13 generating a charge in accordance with light incidence. The shift register 19 is disposed on the side of a light-detective surface 7 opposite to the light incident surface of the semiconductor substrate 1. The light-shielding film 57 is disposed on the side of the light-detective surface 7 of the semiconductor substrate 1. The light-shielding film 57 includes an uneven surface 57a opposing the light-detective surface 7.
摘要:
A high sensitivity image sensor comprises an epitaxial layer of silicon that is intrinsic or lightly p doped (such as a doping level less than about 1013 cm-3). CMOS or CCD circuits are fabricated on the front-side of the epitaxial layer. Epitaxial p and n type layers are grown on the backside of the epitaxial layer. A pure boron layer is deposited on the n-type epitaxial layer. Some boron is driven a few nm into the n-type epitaxial layer from the backside during the boron deposition process. An anti-reflection coating may be applied to the pure boron layer. During operation of the sensor a negative bias voltage of several tens to a few hundred volts is applied to the boron layer to accelerate photo-electrons away from the backside surface and create additional electrons by an avalanche effect. Grounded p-wells protect active circuits as needed from the reversed biased epitaxial layer.
摘要:
A solid-state imaging device 1 is provided with a plurality of photoelectric converting portions 3 each having a photosensitive region 15 and an electric potential gradient forming region 17, and which are juxtaposed so as to be along a direction intersecting with a predetermined direction, a plurality of buffer gate portions 5 each arranged corresponding to a photoelectric converting portion 3 and on the side of the other short side forming a planar shape of the photosensitive region 15, and accumulates a charge generated in the photosensitive region 15 of the corresponding photoelectric converting portion 3, and a shift register 9 which acquires charges respectively transferred from the plurality of buffer gate portions 5, and transfers the charges in the direction intersecting with the predetermined direction, to output the charges. The buffer gate portion 5 has at least two gate electrodes which are arranged along the predetermined direction, and to which predetermined electric potentials are respectively applied so as to increase potential toward the predetermined direction.
摘要:
A charge transfer device of two-line read structure is formed with a first charge transfer path for transferring first-group charges, a second charge transfer path for transferring second-group charges, and a transfer gate portion (106). To complete the transfer operation of all the second-group charges output at a time, the transfer operation of the charges from the first charge transfer path to the second charge transfer path by the transfer gate portion is divided into a plurality of times. In addition, the second-group charges output at a time are transferred for each divided set of pixels in each divided transfer operation.
摘要:
The present invention intends to improve a difference between signal levels of odd-numbered pixels and even-numbered pixels in a CCD (charge coupled device) linear sensor. In a CCD linear sensor comprising a sensor region (1) having an array of a plurality of sensor elements (pixels) (S₁), (S₂), ... and first and second horizontal transfer registers (4) and (5) disposed on the respective sides of the sensor region (1) through read-out gate sections (2) and (3) wherein signal charges of every other sensor elements (S₁), (S₃), (S₅), ... are transferred by the first horizontal transfer register (4) while signal charges of remaining every other sensor elements (S₂), (S₄), (S₆) are transferred by the second horizontal transfer register (5), the first and second horizontal transfer registers (4) and (5) include first and second transfer electrodes (22R₁), (22R₂) to which two-phase drive pulses (φH₁) and (φH₂) are applied, respectively and electrode configurations at the read-out gate section side are formed substantially the same,whereby the capacity of a first transfer section (HR₁) to which the drive pulse (φH₁) is applied is made equal to that of a second transfer section (HR₂) to which the drive pulse (φH₂) is applied.
摘要:
An image sensor includes a plurality of potential monitoring transistors (T21 - T24, T31 - T34) connected to respective floating electrodes (7₁ - 7₄) for separately monitoring changes in potential of the respective floating electrodes. In addition, the image sensor includes an output circuit (T25 - T27, R21; T35 - T37, R31) for producing an output signal (Vo(max), Vo(min)) which varies in accordance with one of the monitored potentials which is one of the highest potential and the lowest potential.
摘要:
A solid state image pickup device comprises: a transparent support (101); one or more transparent substrate chips (102) mounted on the support; one or more photoelectric converting elements (103) formed on the transparent substrate chips; a fixing agent (107) for fixing the transparent substrate chips, at the face opposite to the face on which the photoelectric converting elements are formed, to the support at one end thereof; and an anti-reflection mold (105) for covering the transparent substrate chips on at least the sides thereof, the refractive index of the anti-reflection mold being equal to or larger than that of the transparent substrate chips. Such an arrangement can provide a wide-area type solid state image pickup device, particularly a solid state image pickup device of the in-line type in which element chips are arranged in a line, which is equal in optical and electrical continuity to a single-line solid state image pickup device, and which is of high precision, high reliability, easy to use, of low costs, and compact in structure.