摘要:
This tin or tin alloy electroplating solution according to one aspect contains a soluble salt (A) including at least a stannous salt, one or more compounds (B) selected from the group consisting of an organic acid, an inorganic acid, and a salt thereof, a surfactant (C) that is a polyoxyethylene polycyclic phenyl ether sulfuric acid ester salt represented by the following General Formula (1), and a leveling agent (D).
In General Formula (1), m is an integer of 1 to 3, n is an integer of 10 to 30, and X is a cation.
摘要:
The present invention provides a carboxyl sulfonate compound and preparation method thereof. The present carboxyl sulfonate compound has structure of formula (A): wherein M 1 is hydrogen or an alkali metal; M 2 is hydrogen, alkyl or an alkali metal; Y is hydrogen, alkyl; carboxyl, carboxyl salt; alkylcarboxyl, or alkylcarboxyl salt; n is an integer from 1 to 10; and m is an integer from 1 to 10. The carboxylic group and the sulfonic acid group in the structure of the present carboxyl sulfonate compound show excellent chelating ability to metal ions; therefore, the present carboxyl sulfonate compound is particularly for use in electroplating additive.
摘要:
Reaction products of one or more amino acids and one or more epoxies are included in copper and copper alloy electroplating baths to provide good throwing power. Such reaction products may plate copper and copper alloys with good surface properties and good physical reliability.
摘要:
A metal foil for electromagnetic shielding10, comprising a base 1 consisting of a metal foil, an underlayer 2 including Ni formed on one or both surfaces of the base, and a Sn-Ni alloy layer 3 formed on a surface of the underlayer, wherein the Sn-Ni alloy layer includes 20 to 80 weight% of Sn, and when a total deposition amount of Sn is represented by T Sn [µg/dm 2 ], a percentage of Sn in the Sn-Ni alloy is represented by A Sn [weight%], a total deposition amount of Ni is represented by T Ni [µg/dm 2 ], and a percentage of Ni in the Sn-Ni alloy is represented by A Ni [weight%], T Sn : 500 to 91000 µg/dm 2 , T Ni : 2200 to 236000 µg/dm 2 , 170000 => {T Ni -T Sn x (A Ni /A Sn )} => 1700.
摘要:
A plating solution including (A) a soluble salt containing at least a stannous salt; (B) an acid selected from organic acid and inorganic acid or a salt thereof; and (C) an additive containing a specific ammonium salt is provided.
摘要:
Tin electroplating baths having certain brightening agents and nonionic surfactants provide tin-containing solder deposits having good morphology, reduced void formation and improved within-die uniformity.