公开(公告)号：EP3505986A1

公开(公告)日：2019-07-03

申请号：EP18203945.3

申请日：2018-11-01

申请人： Honeywell International Inc.

发明人： XU, Guobin ,  XU, Haidong ,  ZHANG, Ning

IPC分类号： G02B7/182 ,  G02B5/09 ,  G08B13/193 ,  G08B29/22

摘要： Systems and methods for adjusting a focal length of a mirror are provided. Some systems can include an adjustment device having an slot, a mirror that is rotatable about an axis, and a drive coupled to the mirror and configured to engage the slot, wherein movement of the adjustment device can cause the drive to move within the slot upwards or downwards in accordance with a slope of the slot, thereby rotating the mirror about the axis.

公开(公告)号：EP2937810B1

公开(公告)日：2019-05-08

申请号：EP15161554.9

申请日：2015-03-30

申请人： SICK AG

发明人： Wehrle, Klemens

IPC分类号： G06K7/10 ,  G02B5/09

公开(公告)号：EP3234695B1

公开(公告)日：2018-10-10

申请号：EP15813340.5

申请日：2015-12-15

申请人： Carl Zeiss SMT GmbH

发明人： SAROV, Yanko ,  HOLZ, Markus ,  HAACKER, Fabian ,  WENGLER, Mark Christof ,  HAUF, Markus

IPC分类号： G03F7/20 ,  G02B5/09

CPC分类号： G02B5/09 ,  G02B5/08 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70908

公开(公告)号：EP3294566A1

公开(公告)日：2018-03-21

申请号：EP16721360

申请日：2016-05-04

申请人： GIESECKE+DEVRIENT CURRENCY TECH GMBH

发明人： FUHSE CHRISTIAN

IPC分类号： B42D25/29 ,  B42D25/324 ,  B42D25/425 ,  B44F1/02 ,  B44F1/10 ,  G02B5/09 ,  G02B27/22 ,  G02B27/24

CPC分类号： B42D25/324 ,  B42D25/29 ,  B42D25/425

摘要： The invention relates to a visually variable security element (12) which is intended for safeguarding articles of value and, depending on the viewing angle, shows a motif with at least one representation of a curve (16), which from a first viewing angle is visible as a default curve in a middle position within a presentation area (22) and, when the security element (12) is tilted about two different predetermined axes, moves in different directions away from the middle position within the presentation area (22), with a two-dimensional motif area (20), which in the presentation area (22) is provided with a plurality of reflective, planar facets (30), wherein each planar facet (30) is characterized by an angle of inclination with respect to the plane of the two-dimensional motif area (20) that has as inclination components a parallel component (N
II ) parallel to the default curve in the middle position and a normal component (Ν
I ) perpendicular to the default curve in the middle position, and wherein a first of the two inclination components is chosen for the planar facets (30) of the presentation area (22) on the basis of the distance of the respective facet (30) from the default curve and a second of the two inclination components is chosen in a predetermined spreading-out region irrespective of the distance of the respective facet (30) from the default curve.

公开(公告)号：EP3292441A1

公开(公告)日：2018-03-14

申请号：EP16718368.0

申请日：2016-04-26

申请人： Carl Zeiss SMT GmbH

发明人： FISCHER, Thomas ,  WUNDERLICH, Sarina

IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B5/08 ,  G02B5/09

CPC分类号： G02B5/0891 ,  G02B5/09 ,  G02B26/0833 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/70116 ,  G03F7/70825 ,  G03F7/70833

摘要： A faceted mirror for EUV projection lithography has a plurality of facets (25) for reflecting EUV illumination light. At least some of the facets (25) are produced as orientation facets and have a reflection surface (32), the edge contour (33) of which is oriented along two orientation coordinates (x, y) of a facet overall arrangement. The reflection surface (32) of at least one of the orientation facets (25) has a surface shape which has different curvatures along two axes of curvature (x', y'), wherein said axes of curvature (x', y') are tilted about an end axis tilt angle (α, β) in relation to the orientation coordinates (x, y) of the facet overall arrangement. A faceted mirror is achieved, the EUV performance of which is increased in particular when a projection illumination system fitted with said faceted mirror is operated for longer.

公开(公告)号：EP3100083A1

公开(公告)日：2016-12-07

申请号：EP15705920.5

申请日：2015-01-29

申请人： Carl Zeiss SMT GmbH

发明人： ENKISCH, Hartmut ,  HUBER, Peter ,  STROBEL, Sebastian

IPC分类号： G02B5/08 ,  G02B5/09 ,  G21K1/06

CPC分类号： G03F7/702 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/09 ,  G02B5/10 ,  G02B26/0833 ,  G21K1/062 ,  G21K2201/064

摘要： The invention relates to a method for producing a mirror element, more particularly for a microlithographic projection exposure apparatus. A method according to the invention comprises the following steps: providing a substrate (101, 102, 103, 104, 201, 202, 301, 302, 401, 402, 501, 502, 801, 901, 951, 961) and forming a layer stack (111, 112, 113, 114, 211, 212, 311, 312, 411, 412, 511, 512) on the substrate, wherein forming the layer stack is carried out in such a way that a desired curvature - wanted for a predefined operating temperature - of the mirror element is produced by a bending force exerted by the layer stack, wherein, before the layer stack is formed, the substrate has a curvature deviating from said desired curvature of the mirror element, and wherein the bending force exerted by the layer stack is at least partly produced by an aftertreatment for altering the layer stress of the layer stack being carried out.

公开(公告)号：EP2265979B1

公开(公告)日：2016-05-11

申请号：EP09719397.3

申请日：2009-03-05

申请人： QinetiQ Limited

发明人： O'KEEFE, Eoin, Seiorse ,  SHOHET, Adam, Joseph ,  SWAN, Martin

IPC分类号： F41H13/00 ,  F41H3/00 ,  G02B5/09 ,  G02B5/136

CPC分类号： G02B5/09 ,  F41H3/00 ,  F41H13/00 ,  G02B5/136

公开(公告)号：EP2962158A1

公开(公告)日：2016-01-06

申请号：EP14706630.2

申请日：2014-02-26

申请人： Carl Zeiss SMT GmbH

发明人： ENDRES, Martin ,  ENKISCH, Hartmut ,  BIELING, Stig

IPC分类号： G03F7/20 ,  G02B5/09 ,  G21K1/06

CPC分类号： G03F7/702 ,  G02B5/0875 ,  G02B5/0891 ,  G02B17/0848 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062

摘要： An illumination system for an optical arrangement such as an EUV lithography apparatus, having: at least one optical element which has at least one optical surface, on which a coating which reflects illumination radiation is applied, and an actuator device aligning the optical surface in at least two angular positions in the radiation path. The coating either has a thickness (dOPT1) at which a mean value (½ (R1+R2)) formed from a thickness-dependent reflectivity (R1, R2) of the coating at the at least two angular positions is maximized or has a thickness (dOPT2) at which a maximum change (max(&Dgr;R1/R1, &Dgr;R2/R2)) in the reflectivity (R1, R2) caused by a thickness tolerance of the coating is minimized at the respective angular positions or else the reflecting coating has a thickness (dO2) at which the reflectivity (R1, R2) of the coating has the same magnitude in the at least two angular positions.

摘要翻译： 一种用于光学装置的照明系统，例如EUV光刻设备，具有：具有至少一个光学表面的至少一个光学元件，在其上施加反射照射辐射的涂层，以及将光学表面对准的致动器装置 辐射路径中的至少两个角位置。 涂层还具有厚度（dOPT1），在该厚度（dOPT1）处，由至少两个角位置处的涂层的厚度依赖性反射率（R1，R2）形成的平均值（1/2（R1 + R2））最大化或具有厚度 （dOPT2），其中由涂层的厚度公差引起的反射率（R1，R2）中的最大变化（最大值（＆Dgr; R1 / R1，＆Dgr; R2 / R2））在各个角位置处最小化， 反射涂层具有厚度（dO2），在该厚度下，涂层的反射率（R1，R2）在至少两个角位置具有相同的大小。

公开(公告)号：EP2909660A2

公开(公告)日：2015-08-26

申请号：EP13782657.4

申请日：2013-10-14

申请人： Giesecke & Devrient GmbH

发明人： FUHSE, Christian

IPC分类号： G02B5/09 ,  B44F7/00 ,  B42D15/00 ,  B42D25/00 ,  G02B5/18 ,  G02B5/32 ,  G03H1/00 ,  G07D7/20

CPC分类号： B42D25/328 ,  B42D25/00 ,  B42D25/29 ,  B42D25/324 ,  B42D25/40 ,  B44F7/00 ,  G02B5/09 ,  G02B5/1842 ,  G02B5/1861 ,  G02B5/32 ,  G03H1/0011 ,  G03H1/0248 ,  G07D7/003 ,  G07D7/207 ,  Y10T29/49

摘要： The invention relates to an optically variable surface pattern comprising a carrier (18), which has a first and a second surface region (24, 25), wherein the two surface regions (24, 25) are designed such that the first surface region (24) in a first solid angle range (al), presents a first view (14) that appears curved and the second surface region (25) in a second solid angle range (oc2), which differs from the first solid angle range (al) presents a second view (15) that appears curved.

摘要翻译： 本发明涉及包括具有第一和第二表面区域（24,25）的载体（18）的光学可变表面图案，其中两个表面区域（24,25）被设计为使得第一表面区域 24）在第一立体角范围（α1）中呈现出第一视角（14），该第一视角（14）在第二立体角范围（α2）中呈现弯曲并且第二表面区域（25）与第一立体角范围（α1） ）呈现呈现弯曲的第二视图（15）。

公开(公告)号：EP2331885A4

公开(公告)日：2014-07-09

申请号：EP09818531

申请日：2009-10-01

申请人： POLK STEVEN

发明人： BUTLER BARRY L ,  DAVENPORT ROGER L ,  NEMAZI JOHN E

IPC分类号： F24J2/38 ,  F24J2/07 ,  F24J2/10 ,  F24J2/16 ,  F24J2/24 ,  F24J2/36 ,  F24J2/40 ,  F24J2/52 ,  F24J2/54 ,  G01J1/20 ,  G02B5/08 ,  G02B5/09 ,  G02B7/183

CPC分类号： F24J2/16 ,  F24J2/07 ,  F24J2/245 ,  F24J2/248 ,  F24J2/36 ,  F24J2/40 ,  F24J2/405 ,  F24J2/542 ,  F24J2002/1085 ,  F24J2002/5462 ,  F24J2002/5465 ,  F24J2002/5479 ,  F24J2002/5486 ,  G02B5/09 ,  G02B7/183 ,  Y02B10/20 ,  Y02E10/41 ,  Y02E10/44 ,  Y02E10/46 ,  Y02E10/47

摘要： A solar collector is provided with a reflective panel assembly that is supported by a frame and pivots about a first horizontal axis. The panel assembly is configured for reflecting sunlight to a common focal point, and includes a central panel and a pair of outer panels each pivotally coupled to the central panel and configured for folding over the central panel. A collector assembly is mounted relative to the frame and pivotal about a second horizontal axis. The collector assembly is configured for collecting solar energy and includes a receiver that is positioned at the focal point. The receiver is configured for extracting energy from the reflected sunlight. The solar collector may also include a four-bar linkage assembly for supporting the panel assembly and the collector assembly during movement from a collapsed position and a partially extended position.