公开(公告)号：EP4286941A2

公开(公告)日：2023-12-06

申请号：EP23203497.5

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： AZEREDO LIMA, Jorge, Manuel ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  DE KLERK, Angelo, Cesar, Peter ,  DEKKERS, Jeroen ,  DINGS, Jacobus, Maria ,  JANSEN, Maarten, Mathijs, Marinus ,  JANSSEN, Maurice, Leonardus, Johannes ,  JANSSEN, Paul ,  KERSTENS, Roland, Jacobus, Johannes ,  KESTER, Martinus, Jozef, Maria ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LOOPSTRA, Erik, Roelof ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester, Matheus ,  THEUERZEIT, Frank, Johannes, Christiaan ,  VAN DEN BOSCH, Gerrit ,  VAN DER MEULEN, Frits ,  VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC分类号： G03F1/64

摘要： Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP3467586B1

公开(公告)日：2023-03-01

申请号：EP18209474.8

申请日：2016-07-27

发明人： Grenon, Brian J. ,  Boyette, James

IPC分类号： G03F1/64

公开(公告)号：EP4095601A1

公开(公告)日：2022-11-30

申请号：EP21744046.0

申请日：2021-01-15

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： YANASE, Yu

IPC分类号： G03F1/64

摘要： Provided are a pellicle frame, a pellicle, a method for inspecting a pellicle, a pellicle-attached exposure original plate and exposure method, and a method for manufacturing a semiconductor or a liquid crystal display board, wherein a frame-shaped pellicle frame (1) having an upper end surface (13) provided with a pellicle film and a lower end surface (14) facing a photomask has, on at least the inner surface (11) thereof, a minimum reflectance of 20% or less at a light source wavelength of 500-1000 nm. The present invention can provide: a pellicle frame in which by lowering the reflectance of the inner surface (11) of the pellicle frame with respect to inspection light, scattered light from the frame can be suppressed as much as possible, and foreign matter inspection can be improved, and at the same time, by lowering the reflectance only with respect to the wavelength of the inspection light, there are few restrictions such as those related to coloring of the pellicle frame; a pellicle using said pellicle frame; and a method for inspecting said pellicle.

公开(公告)号：EP4071522A1

公开(公告)日：2022-10-12

申请号：EP20897482.4

申请日：2020-10-29

申请人： Nippon Light Metal Co., Ltd.

发明人： IIZUKA Akira ,  OSHIMA Takeshi ,  NAKANO Koichi

IPC分类号： G02B1/111 ,  C01B33/12 ,  C23C26/00 ,  C23C28/04 ,  C25D11/18 ,  C25D11/22 ,  C25D11/26 ,  G02B1/10 ,  G03F1/64

摘要： The present invention provides: a lightweight optical member which can be produced at relatively low cost and which provides low reflectance, stability upon exposure to light, and abrasion resistance; and an efficient method for producing such an optical member. An optical member according to the present invention is characterized by comprising: a metallic base material; a low-reflective treatment layer formed on the surface of the metallic base material; and a silica layer formed on the surface of the low-reflective treatment layer. It is preferable for the silica layer to have a layer thickness of 0.1-10 µm.

公开(公告)号：EP3489755B1

公开(公告)日：2022-08-17

申请号：EP17743236.6

申请日：2017-02-22

发明人： LV, Shouhua ,  LI, Baojun

IPC分类号： G03F1/64 ,  G03F7/12 ,  G03F9/00 ,  H01L21/027 ,  C23C14/04 ,  G03F1/50 ,  H01L51/00 ,  C23C14/12

公开(公告)号：EP3391151B1

公开(公告)日：2022-02-16

申请号：EP16805433.6

申请日：2016-12-02

发明人： JANSSEN, Paul ,  KLOOTWIJK, Johan Hendrik ,  VAN DEN EINDEN, Wilhelmus Theodorus Anthonius Johannes ,  ZDRAVKOV, Alexandar Nikolov

IPC分类号： G03F7/20 ,  G03F1/62 ,  G03F1/64

公开(公告)号：EP3276413B1

公开(公告)日：2022-02-16

申请号：EP15795099.9

申请日：2015-07-20

发明人： FUJINO, Seiji ,  ZHANG, Song ,  WANG, Tao ,  GAO, Jing ,  DU, Xiaobo

IPC分类号： G03F1/64 ,  G03F7/20 ,  G03F1/50 ,  H01L27/12

公开(公告)号：EP2306240B1

公开(公告)日：2021-11-03

申请号：EP10185886.8

申请日：2010-10-01

发明人： Tsukada, Junichi ,  Shirasaki, Toru

IPC分类号： G03F1/00 ,  G03F1/62 ,  G03F1/64

公开(公告)号：EP3798728A1

公开(公告)日：2021-03-31

申请号：EP19219207.8

申请日：2019-12-23

申请人： S&S Tech Co., Ltd.

发明人： NAM, Kee-Soo ,  LEE, Chang-Hun ,  YUN, Jong-Won ,  PARK, Chul-Kyun

IPC分类号： G03F1/62 ,  G03F1/64

摘要： Disclosed is a pellicle for extreme ultraviolet (EUV) lithography, with a core layer (10) formed on a pellicle frame (90), the core layer comprising: a first layer (11); and a second layer (12). The first layer includes silicon. The second layer includes one among a metal silicide that has silicon with metal, a silicon compound that has silicon with a light element, and a metal silicide compound that has silicon with metal and a light element. With this, the pellicle is improved in mechanical, thermal and chemical stability with minimum loss of optical characteristics.

公开(公告)号：EP2927745B1

公开(公告)日：2020-04-22

申请号：EP15157728.5

申请日：2015-03-05

申请人： SHIN-ETSU CHEMICAL CO., LTD

发明人： Horikoshi, Jun

IPC分类号： G03F1/00 ,  G03F1/64 ,  G03F1/62