CRYSTALLINE CHROMIUM DEPOSIT
    135.
    发明授权
    CRYSTALLINE CHROMIUM DEPOSIT 有权
    结晶铬矿床

    公开(公告)号:EP2010697B1

    公开(公告)日:2018-03-07

    申请号:EP07759561.9

    申请日:2007-03-28

    摘要: A crystalline chromium deposit having a lattice parameter of 2.8895+/−0.0025 Å, and an article including the crystalline chromium deposit. An article including a crystalline chromium deposit, wherein the crystalline chromium deposit has a {111} preferred orientation. A process for electrodepositing a crystalline chromium deposit on a substrate, including providing an electroplating bath comprising trivalent chromium and a source of divalent sulfur, and substantially free of hexavalent chromium; immersing a substrate in the electroplating bath; and applying an electrical current to deposit a crystalline chromium deposit on the substrate, wherein the chromium deposit is crystalline as deposited.

    FLEXIBLE COLOR ADJUSTMENT FOR DARK CR(III)-PLATINGS
    137.
    发明公开
    FLEXIBLE COLOR ADJUSTMENT FOR DARK CR(III)-PLATINGS 审中-公开
    灵活的FARBEINSTELLUNGFÜRDUNKLE CR(III)-PLATTIERUNGEN

    公开(公告)号:EP3147388A1

    公开(公告)日:2017-03-29

    申请号:EP15186811.4

    申请日:2015-09-25

    摘要: The invention relates to a process for the adjustment of the lightness L* of electrolytically deposited chromium-finishes on workpieces obtained by an electroplating bath at least comprising chromium(III)-ions and sulfur containing organic compounds, wherein the concentration of the sulfur containing organic compounds in the bath is adjusted by passing at least a part of the bath composition through an activated carbon filter.

    摘要翻译: 本发明涉及一种通过至少包含铬(III)和含硫有机化合物的电镀浴获得的工件上的电解沉积铬涂层的亮度L *的调节方法,其中含硫有机物 通过使至少一部分浴组合物通过活性炭过滤器来调节浴中的化合物。

    IONIC LIQUID ELECTROLYTE AND METHOD TO ELECTRODEPOSIT METALS
    138.
    发明公开
    IONIC LIQUID ELECTROLYTE AND METHOD TO ELECTRODEPOSIT METALS 审中-公开
    IONISCHERFLÜSSIGELEKTROLYTUND VERFAHREN ZUR ELEKTROPLATTIERUNG VON METALLEN

    公开(公告)号:EP3132071A1

    公开(公告)日:2017-02-22

    申请号:EP15723342.0

    申请日:2015-04-14

    摘要: An electrolyte and a method to electroplate a metal on a substrate using the electrolyte are described. The electrolyte includes an imidazolium compound, a metal salt, and water. The imidazolium compound has formula (I) wherein R1, R2, R3, R4, and R5 are each independently selected from an H atom and an organic radical. L− is a compatible anion. The metal salt can include but is not limited to salts of the metals Li, Mg, Ca, Cr, Mn, Fe, Co, Ni, Cu, Zn, Cd, Pb, Bi, La, Ce, Al, Ag, Au, Ga, V, In, Nb, Mo, and W.

    摘要翻译: 描述了电解质和使用电解质在基片上电镀金属的方法。 电解质包括咪唑鎓化合物,金属盐和水。 咪唑鎓化合物具有式(I),其中R 1,R 2,R 3,R 4和R 5各自独立地选自H原子和有机基团。 L-是相容的阴离子。 金属盐可以包括但不限于金属Li,Mg,Ca,Cr,Mn,Fe,Co,Ni,Cu,Zn,Cd,Pb,Bi,La,Ce,Al,Ag,Au, Ga,V,In,Nb,Mo和W.