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    METHOD FOR PRODUCING TITANIUM-PLATED MEMBER
    3.
    发明公开
    METHOD FOR PRODUCING TITANIUM-PLATED MEMBER 审中-公开

    公开(公告)号：EP3633078A1

    公开(公告)日：2020-04-08

    申请号：EP18806582.5

    申请日：2018-03-13

    Applicant: Sumitomo Electric Industries, Ltd.

    Inventor： NUMATA, Koma ,  MAJIMA, Masatoshi ,  AWAZU, Tomoyuki

    IPC: C25D5/48 ,  C23G1/32 ,  C25D3/66

    Abstract: A method for manufacturing a titanium-plated member includes: preparing a substrate having an electrically conductive surface; immersing the substrate in a molten-salt titanium plating solution composition containing ions of at least one Group I metal selected from the group of Li + and Na + , F - , and Ti n+ ; forming a titanium plating film on the surface of the substrate by applying electric current to cause the substrate immersed in the molten-salt titanium plating solution composition to serve as a cathode and cause the surface of the substrate to be coated with titanium; cleaning the titanium plating film by bringing the titanium plating film into contact with a cleaning molten salt, to remove a first adhering matter caused to adhere to a surface of the titanium plating film during the forming of the titanium plating film, the cleaning molten salt containing at least one compound selected from the group consisting of alkaline metal chloride, alkaline earth metal chloride, and potassium fluoride; and cleaning the titanium plating film with water to remove a second adhering matter caused to adhere to the surface of the titanium plating film during the cleaning with the cleaning molten salt.

    SYSTEMS, METHODS, AND ANODES FOR ENHANCED IONIC LIQUID BATH PLATING OF TURBOMACHINE COMPONENTS AND OTHER WORKPIECES
    5.
    发明公开
    SYSTEMS, METHODS, AND ANODES FOR ENHANCED IONIC LIQUID BATH PLATING OF TURBOMACHINE COMPONENTS AND OTHER WORKPIECES 审中-公开

    公开(公告)号：EP3421644A1

    公开(公告)日：2019-01-02

    申请号：EP18178913.2

    申请日：2018-06-20

    Applicant: Honeywell International Inc.

    Inventor： PIASCIK, James ,  CHUNG, Vincent ,  POANDL, Lee

    IPC: C25D3/66 ,  C25D17/00 ,  C25D21/04 ,  C25D19/00 ,  C25D17/12 ,  F01D5/28

    Abstract: Ionic liquid bath plating systems (10), methods, and plating anodes (32, 34, 72, 74, 92, 94) are provided for depositing metallic layers over turbomachine components (26, 28, 70, 108) and other workpieces. In an embodiment, the method includes placing workpieces (26, 28, 70, 108) in a plurality of cell vessels (18) such that the workpieces (26, 28, 70, 108) are at least partially submerged in plating solution baths (22), which are retained within the cell vessels (18) when the plating system is filled with a selected non-aqueous plating solution. After plating anodes (32, 34, 74, 76, 92, 94) are positioned adjacent the workpieces (26, 28, 70, 108) in the plating solution baths (22), the plurality of cell vessels (18) are enclosed with lids (20) such that the plurality of cell vessels (18) contain vessel headspaces (24) above the plating solution baths (22). A first purge gas (62) is then injected into the plurality of cell vessels (18) to purge the vessel headspaces (24). The workpieces (26, 28, 70, 108) and the plating anodes (32, 34, 74, 76, 92, 94) are then energized to deposit metallic layers on selected surfaces of the workpieces (26, 28, 70, 108) utilizing an ionic liquid bath plating process.

    EUTECTIC MIXTURES BASED UPON MULTIVALENT METAL IONS
    6.
    发明授权
    EUTECTIC MIXTURES BASED UPON MULTIVALENT METAL IONS 有权

    公开(公告)号：EP1899504B1

    公开(公告)日：2018-10-10

    申请号：EP06755731.4

    申请日：2006-07-06

    Applicant: UNIVERSITY OF LEICESTER

    Inventor： ABBOTT, Andrew, Peter

    IPC: C25C3/00 ,  C25D3/66 ,  B01J31/02

    CPC classification number: C25D3/02 ,  C25C3/00 ,  C25D3/22 ,  C25D3/30 ,  C25F3/00 ,  H01M2300/0022 ,  H01M2300/0025

    Abstract: There is provided a mixture having a freezing point of up to 50° C., formed by reaction between: (A) one molar equivalent of a salt of formula I (Mn+)(X-)n I or a hydrate thereof; and (B) from one to eight molar equivalents of a complexing agent comprising one or more uncharged organic compounds, each of which compounds has (i) a hydrogen atom that is capable of forming a hydrogen bond with the anion X-; and (ii) a heteroatom selected from the group consisting of O, S, N and P that is capable of forming a coordinative bond with the metal ion Mn+, which reaction is performed in the absence of extraneous solvent, wherein M, X- mind a have meaning given in the description.

    ALUMINUM FILM MANUFACTURING METHOD AND MANUFACTURING DEVICE
    10.
    发明公开
    ALUMINUM FILM MANUFACTURING METHOD AND MANUFACTURING DEVICE 有权
    铝合金塑料门窗

    公开(公告)号：EP3103895A4

    公开(公告)日：2017-02-22

    申请号：EP15746409

    申请日：2015-01-26

    Applicant: SUMITOMO ELECTRIC INDUSTRIES

    Inventor： NISHIMURA JUNICHI ,  HOSOE AKIHISA ,  OKUNO KAZUKI ,  KIMURA KOUTAROU ,  GOTO KENGO ,  SAKAIDA HIDEAKI ,  MOTOMURA JUNICHI

    IPC: C25D1/08 ,  C25D1/00 ,  C25D3/66 ,  C25D5/00 ,  C25D5/56 ,  C25D7/06 ,  C25D17/00 ,  C25D21/04

    CPC classification number: C25D5/56 ,  C25D1/08 ,  C25D3/66 ,  C25D3/665 ,  C25D5/003 ,  C25D7/0614 ,  C25D7/0621 ,  C25D17/004 ,  C25D21/04

    Abstract: Provided are a manufacturing method and a manufacturing apparatus for an aluminum film in which moisture and oxygen do not intrude into a plating chamber. A manufacturing method for an aluminum film, in which aluminum is electrodeposited on a surface of a long, porous resin substrate imparted with electrical conductivity in a molten salt electrolytic solution, includes a step of transferring the substrate W into a plating chamber 1 through a sealing chamber 4 disposed on the entrance side of the plating chamber; a step of electrodepositing an aluminum film on the surface of the substrate W in the plating chamber 1; and a step of transferring the substrate having the aluminum film electrodeposited thereon from the plating chamber 1 through a sealing chamber 5 disposed on the exit side of the plating chamber 1, in which an inert gas is supplied into the plating chamber such that the plating chamber has a positive pressure relative to outside air, and the inert gas is forcibly discharged from an inert gas exhaust pipe 7 provided on each of the two sealing chambers.

    Abstract translation: 本发明提供水分和氧不侵入电镀室的铝膜的制造方法和制造装置。 在熔融盐电解液中赋予了导电性的长条状的多孔树脂基板的表面上电沉积铝的铝膜的制造方法包括通过密封将基板W转移到电镀室1内的工序 设置在电镀室入口侧的室4; 在电镀腔室1中在基片W的表面上电镀铝膜的步骤; 以及通过设置在电镀腔室1的出口侧的密封腔室5将其上电镀有铝膜的基板从电镀腔室1转移到电镀腔室1中，其中惰性气体被供应到电镀腔室中，使得电镀腔室 具有相对于外部空气的正压，并且惰性气体被强制地从设置在两个密封室中的每一个上的惰性气体排出管7排出。

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