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11.发明公开
公开(公告)号：EP1706790A1
公开(公告)日：2006-10-04
申请号：EP05701043.1
申请日：2005-01-19
CPC分类号： G03F7/027 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41N1/083 , Y10S430/122 , Y10S430/145
摘要： Lithographic printing plate precursor comprising: a) an untreated or pretreated substrate and b) a radiation-sensitive coating comprising: (i) at least one polymeric binder soluble or swellable in aqueous alkaline developers; (ii) at least one free-radical polymerizable monomer and/or oligomer comprising at least one non-aromatic C-C double bond and at least one SH group in the molecule; and (iii) a radiation-sensitive initiator or initiator system for free-radical polymerization, wherein component (ii) has the formula (I) wherein each R1a, R1b and R1c is independently selected from H, C1-C6 alkyl, C2-C8 alkenyl, aryl, halogen, CN and COOR1d, wherein Rid is H, C1-C18 alkyl, C2-C8 alkenyl, C2-C8 alkynyl or aryl; and Z is an aliphatic, heterocyclic or heteroaromatic spacer or a combination of two or more thereof, wherein Z can optionally comprise one or more additional SH groups and/or one or more additional non-aromatic C-C double bonds; and each Z1 is independently selected from a single bond, formulae (Ia), (Ib), (Ic), (Id), (Ie), (If), (Ig), (Ih), (Ij), (Ik), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), wherein R2a, R2b and R2c are independently selected from H, C1-C6 alkyl and aryl, Z2 is selected from a single bond, O, S and NR2c, Z3 is a single bond which is connected to Z, b is an integer from 1 to 10 and c is an integer from 1 to 3.
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公开(公告)号：EP1444552B1
公开(公告)日：2006-04-19
申请号：EP02789645.5
申请日：2002-11-13
IPC分类号： G03F7/30
CPC分类号： G03F7/3092
摘要： A method for the refreshment and reuse of loaded developers used in lithographic printing is disclosed. A polyoxyalkylene derivative is added to a silicate-containing loaded developer. Insoluble material is separated and the alkalinity level of the resulting essentially colorless liquid adjusted to produce a refreshed developer. The refreshed developer may be used to develop additional exposed imageable elements.
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公开(公告)号：EP1588220A1
公开(公告)日：2005-10-26
申请号：EP03817922.2
申请日：2003-07-17
IPC分类号： G03F7/40
CPC分类号： B41M7/009 , B41C1/1008 , B41C1/1075 , B41C1/1083 , B41C2210/04 , B41C2210/06 , B41M7/00 , B41N3/08 , Y10T428/24802
摘要： An apparatus and method for improving the durability of an image on an imaging material, including increasing the press run length or a printing plate. The apparatus and method can involve the use of, as an example but not restricted to, an imaging device, a pre-bake oven, a processor, and a post-process treatment unit that employs infrared lamps adapted to irradiate the image.
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公开(公告)号：EP1567597A1
公开(公告)日：2005-08-31
申请号：EP03785742.2
申请日：2003-12-04
IPC分类号： C09B23/00
CPC分类号： C09B23/0066 , C09B23/0016 , C09B23/0033 , C09B23/0041 , C09B23/086
摘要： A single-step process for the production of meso-substituted cyanine dyes is provided comprising the reaction of a dye (III), with (a) a methylene compound (IV) or (V) or a quaternary salt (VI) or (VII) and (b) a compound selected from functionalized (hetero)aromatic compounds Ar-B, saturated cyclic amines (IV) and heteroaromatic compounds (V).
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15.发明公开
公开(公告)号：EP1543046A1
公开(公告)日：2005-06-22
申请号：EP03790933.0
申请日：2003-08-28
CPC分类号： C08F8/14 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , C08F8/28 , C08F8/46 , C08L59/00 , C08L61/00 , C08F16/06 , C08F216/38 , C08L2666/16
摘要： Heat-sensitive element comprising (a) an optionally pre-treated substrate (b) a positive working heat-sensitive coating comprising (i) at least one novolak resin, (ii) at least one component which reduces the aqueous alkaline developer solubility of novolak, wherein said reduction in solubility is reversed upon the application of heat, and (iii) at least one acidic polyvinyl acetal comprising the structural units (A), (B), (C) (A) (B) (C) and (D) wherein (D) is at least one unit selected from (D-1), (D-2), and (D-3): (D-1) (D-2) (D-3) wherein R1 is a hydrogen atom or a C1-C4 alkyl group, R2 is a hydrogen atom or a C1-C18 alkyl group, R3 is a hydrogen atom or a C1-C4 alkyl group, R4 is a hydrogen atom or a C1-C4 alkyl group, R5 is -COOH, -(CH2)a-COOH, -O-(CH2)a-COOH, -SO3H, -PO3H2 or -PO4H2, a is an integer from 1 to 8, and X is selected from -(CR6R7)n- and -CR8=CR9- wherein n is an integer of 1 to 6, each R6 and R7 is independently selected from a hydrogen atom and C1-C6 alkyl group, and R8 and R9 are independently selected from a hydrogen atom and a C1- C6 alkyl group or R8 and R9 together with the two carbon atoms to which they are bonded, form an optionally substituted aryl or heteroaryl group, wherein components (i) and (ii) do not have to be present as separate substances but may be used in the form of an appropriately functionalized novolak.
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公开(公告)号：EP1449675A1
公开(公告)日：2004-08-25
申请号：EP04003616.2
申请日：2004-02-18
CPC分类号： B41M5/368 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： Heat-sensitive element, comprising
(a) an optionally pretreated substrate
(b) a positive working heat-sensitive coating, comprising at least one phenolic resin and at least one inhibitor polymer selected from
(i) polymers comprising saturated (hetero)cyclic moieties with at least one carbonyl group, the carbon atom of which is part of the (hetero)cyclic moiety, said (hetero)cyclic moieties being bonded to a polymer chain directly
(ii) polymers comprising unsaturated heterocyclic moieties which are bonded to a polymer chain directly and which have a ring nitrogen atom, said ring nitrogen atom being bonded to the two adjacent ring carbon atoms via a single bond and a double bond and moreover having a free electron pair, and
(iii) copolymers comprising both saturated (hetero)cyclic moieties as defined in (i) and unsaturated heterocyclic moieties as defined in (ii).摘要翻译： （a）任选预处理的基材（b）正性热敏涂层，其包含至少一种酚醛树脂和至少一种抑制剂聚合物，所述抑制剂聚合物选自（i）包含饱和（杂）环部分的聚合物与 至少一个羰基，其碳原子是（杂）环部分的一部分，所述（杂）环部分直接键合到聚合物链上;（ii）包含直接键合到聚合物链上的不饱和杂环部分的聚合物 并且其具有环氮原子，所述环氮原子通过单键和双键与两个相邻的环碳原子键合，并且还具有自由电子对，和（iii）包含饱和（杂）环状部分 如（i）中所定义的和（ii）中定义的不饱和杂环部分。
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17.发明公开Polymeric acetal resins containing free radical inhibitors and their use in lithographic printing 审中-公开聚合物 - 乙酸乙烯酯和氟乙烯（Flahdruckverfahren）
公开(公告)号：EP1350801A1
公开(公告)日：2003-10-08
申请号：EP03007460.3
申请日：2003-04-04
发明人： Dwars, Udo , Baumann, Harald , Glatt, Ingrid , Glatt, Hans-Horst
CPC分类号： C08F8/00 , C08F216/06
摘要： Polymeric acetal resins useful in lithographic printing are disclosed. The polymeric acetal resin contains units (A), (B), (C), (D), and (E). Unit (A) is a vinyl alcohol unit. Unit; (B) is a polyvinyl acetal unit containing an R group, where R is hydrogen, an aliphatic group, an aromatic group, or an arylaliphatic group. Unit (C) is a vinyl carboxylate unit. Unit (D) is an acidic vinyl acetal unit and/or a residue of an acidic vinyl monomer. Unit (E) is a free radical polymerization-inhibiting vinyl acetal unit and/or a free radical polymerization-inhibiting vinyl alcohol ester unit. The resin comprises about 10 to about 60 mol% of unit (A), about 5 to about 60 mol% of unit (B), about 0.3 to about 30 mol% of unit (C), about 1 to about 40 mol% of unit (D), and about 0.01 to about 2 mol% of unit (E).
摘要翻译： 公开了可用于平版印刷的聚合缩醛树脂。 聚合物缩醛树脂含有单元（A），（B），（C），（D）和（E）。 单元（A）是乙烯醇单元。 单元; （B）是含有R基团的聚乙烯醇缩醛单元，其中R是氢，脂族基团，芳族基团或芳基脂族基团。 单元（C）是羧酸乙烯酯单元。 单元（D）是酸性乙烯基缩醛单元和/或酸性乙烯基单体的残基。 单元（E）是一种自由基聚合抑制乙烯基缩醛单元和/或自由基聚合抑制乙烯醇酯单元。 树脂包含约10至约60mol％的单元（A），约5至约60mol％的单元（B），约0.3至约30mol％的单元（C），约1至约40mol％的单元 单位（D）和约0.01至约2摩尔％的单元（E）。
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18.发明公开Radiation-sensitive, positive working coating composition based on carboxylic copolymers 审中-公开基于羧基官能化共聚物的放射线敏感性，正性工作组合物涂层
公开(公告)号：EP1276010A2
公开(公告)日：2003-01-15
申请号：EP02015549.5
申请日：2002-07-11
发明人： Hauck, Gerhard , Jarek, Mathias
IPC分类号： G03F7/023
CPC分类号： G03F7/0233
摘要： A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the composition are disclosed. The composition comprises at least one quinonediazide compound and at least one carboxylic copolymer. The compositions produce lithographic printing plates that show high print run stability.
摘要翻译： 的放射线敏感性组合物，用于平版印刷版及平版印刷版原版，其包括组合物的制备中有用的正性涂料组合物是游离缺失盘。 所述组合物包含至少一种醌重氮化合物和至少一种羧酸共聚物。 该组合物产生平版印刷版确实表现出较高的打印运行的稳定性。
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19.发明公开Thermal initiator system using leuco dyes and polyhalogene compounds 有权Thermisches Initiatorsystem，das Leukofarbstoffe und Polyhalogenverbindungen werwendet
公开(公告)号：EP1249343A2
公开(公告)日：2002-10-16
申请号：EP02008135.2
申请日：2002-04-11
IPC分类号： B41C1/10
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/22 , B41C2210/24 , B41M5/465 , Y10S430/116 , Y10S430/117 , Y10S430/118 , Y10S430/119 , Y10S430/12 , Y10S430/121 , Y10S430/126 , Y10S430/127 , Y10S430/145 , Y10S430/146
摘要： The present invention relates to IR-sensitive compositions containing an initator system comprising:
(a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments
(b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds
(c) at least one polycarboxylic acid represented by the following formula I
R 4 -(CR 5 R 6 ) r -Y-CH 2 COOH (I)
wherein Y is selected from the group consisting of O, S and NR 7 , each of R 4 , R 5 and R 6 is independently selected from the group consisting of hydrogen, C 1 -C 4 alkyl, aryl which is optionally substituted, -COOH and NR 8 CH 2 COOH,
R 7 is selected from the group consisting of hydrogen, C 1 -C 6 alkyl, -CH 2 CH 2 OH, and C 1 -C 5 alkyl substituted with -COOH,
R8 is selected from the group consisting of -CH 2 COOH, -CH 2 OH and -(CH 2 ) 2 N(CH 2 COOH) 2
and r is 0, 1, 2 or 3
with the proviso that at least one of R 4 , R 5 , R 6 , R 7 and R 8 comprises a -COOH group
or salts thereof, and
(d) at least one leuco dye,
wherein the following inequation is met:
ox a b + 1.6 eV
with ox a = oxidation potential of component (a) in eV
red b = reduction potential of component (b) in eV
These compositions are inter alia extraordinarily suitable for the manufacture of printing plates.摘要翻译： 本发明涉及含有引发剂体系的IR敏感性组合物，其包含：（a）至少一种能够吸收选自三芳基胺染料，噻唑鎓染料，吲哚鎓染料，恶唑鎓染料，花青染料，聚苯胺染料，聚吡咯染料， 聚噻吩染料和酞菁颜料（b）至少一种能够产生选自多卤烷基取代的化合物的基团的化合物（c）至少一种由下式IR 4 - （CR 5 R 6）表示的多元羧酸， RY-CH2COOH其中Y选自O，S和NR 7，R 4，R 5和R 6各自独立地选自氢，C 1 -C 4 烷基，任选取代的芳基，-COOH和NR 8 CH 2 COOH，R 7选自氢，C 1 -C 6烷基，-CH 2 CH 2 OH和被-COOH取代的C 1 -C 5烷基，R 8是 选自-CH 2 COOH，-CH 2 OH和 - （CH 2）2 N（CH 2 COOH）2，且r为0， 1,2或3，条件是R 4，R 5，R 6，R 7和R 8中的至少一个包含-COOH基团或其盐，和（d） 至少一种无色染料，其中满足以下不符合要求：oxa
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20.发明公开Radiation-sensitive compositions for printing plates for improving their chemical and developer resistance and printing plates comprising said compositions 有权具有改善的耐化学性和显影剂性印刷板的放射线敏感性组合物，和用这些组合物，印刷板制备
公开(公告)号：EP1074887A1
公开(公告)日：2001-02-07
申请号：EP00116172.8
申请日：2000-08-01
发明人： Jarek, Mathias , Hauck, Gerhard
IPC分类号： G03F7/023
CPC分类号： G03F7/0233
摘要： The invention describes radiation-sensitive compositions comprising at least one novolak, at least one naphthoquinone diazide derivative and a copolymer; the copolymer consisting of the units A, B and C
wherein unit A is present in an amount of 5 to a maximum of 50 mol% and R 1 and R 4 are selected such that the homopolymer of A is alkali-soluble,
B is present in an amount of 20 to 70 mol% and R 2 , R 6 and R 7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10 to 50 mol% and R 3 and R 5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.
Furthermore, the invention describes printing plates produced therefrom.摘要翻译： 本发明描述的辐射敏感组合物，包含至少一种酚醛清漆，至少一种重氮萘醌衍生物和共聚物; 该共聚物由...组成单元A，B和C
worin单元A的存在以5量为最多50％（摩尔）和R <1>和R <4>被选择检查确实A的均聚物 碱可溶性，B存在于在20〜70摩尔％和R <2>，R <6>和R <7>中选择检查没有B的均聚物具有较高的玻璃化转变温度，而C是本 在以10至50摩尔％的量存在和R <3>和R <5>进行选择检查没有C的均聚物是水溶性的，并且确实单元A是来自单元C.进一步不同，本发明描述从那里生产印刷板 ，
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