公开(公告)号：EP1569036B1

公开(公告)日：2013-01-30

申请号：EP05251193.8

申请日：2005-02-28

申请人： CANON KABUSHIKI KAISHA

发明人： Suzuki, Masayuki

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70958

公开(公告)号：EP1418467A2

公开(公告)日：2004-05-12

申请号：EP03025299.3

申请日：2003-11-06

申请人： CANON KABUSHIKI KAISHA

发明人： Suzuki, Masayuki

IPC分类号： G03F7/20 ,  G02B17/06

CPC分类号： G03F7/70233 ,  G02B17/0657

摘要： Disclosed is a projection optical system specifically to be used with extreme ultraviolet (EUV) light having a wavelength not less than 10 nm and not greater than 20 nm. The projection optical system has six mirrors sequentially reflecting light in an order from the object side toward the image side and being disposed to define a coaxial system, wherein each of the six mirrors has a curvature radius not greater than 1500 mm.

摘要翻译： 公开了一种特别用于具有不小于10nm且不大于20nm的波长的极紫外（EUV）光的投影光学系统。 投影光学系统具有六个反射镜，其从物侧到像侧依次反射光，并被设置成限定同轴系统，其中六个反射镜中的每一个具有不大于1500mm的曲率半径。

公开(公告)号：EP0466143A3

公开(公告)日：1992-05-13

申请号：EP91111517.8

申请日：1991-07-10

申请人： CANON KABUSHIKI KAISHA

发明人： Isaka, Kazuo ,  Suzuki, Masayuki ,  Mouri, Akihiro

IPC分类号： G02B27/00

CPC分类号： G02B26/12 ,  G02B27/0031

摘要： An image forming apparatus forms image information by introducing a light beam (6) emitted from a light source (1) and deflected by a light deflecting device (4) to the surface (7) of an image carrying member (10) through an optical image forming system (5) and then by scanning the surface of the image carrying member using that light beam. The surface (7) to be scanned of the image carrying member (10) is shaped into a form which corresponds to the optical characteristics of the optical forming system. Consequently, the resultant image forming apparatus has a simple structure and is capable of forming high definition images.

公开(公告)号：EP0407988A3

公开(公告)日：1991-11-06

申请号：EP90113183.9

申请日：1990-07-10

申请人： CANON KABUSHIKI KAISHA

发明人： Suzuki, Masayuki ,  Hoshino, Osamu ,  Shiraiwa, Yoshinobu ,  Minoura, Kazuo

IPC分类号： G02B26/10

CPC分类号： G02B26/127 ,  G02B27/0031

摘要： A scanning optical device for scanning a material to be scanned with beams emitted from a light source (1) thereof, has a storage device for storing information relating to the quantity of deviation of a scanning optical system. The convergent position of the beams is adjustable in the direction of the optical axis by at least partially controlling the elements of the scanning optical system in accordance with information relating the quantity of deviation supplied by the storage device. The quantity of deviation such as an image distortion of the scanning optical system can be compensated by a simple structure. Therefore, a recording device or reading device employing the scanning optical system exhibiting high resolution, low cost and a capability of preventing deterioration in the gradation expression can be realized.

公开(公告)号：EP1471389A3

公开(公告)日：2006-06-07

申请号：EP04252392.8

申请日：2004-04-23

申请人： CANON KABUSHIKI KAISHA

发明人： Sasaki, Takahiro ,  Suzuki, Masayuki

IPC分类号： G03F7/20 ,  G02B17/06 ,  H01L21/027

CPC分类号： G03F7/70233 ,  G02B17/0657 ,  G03F7/70275

摘要： Disclosed is a projection optical system (100) for projecting a pattern of a mask placed on an object plane (MS), onto a substrate placed on an image plane (W). The projection optical system is arranged so that an intermediate image (MI) of the pattern formed on the mask, is formed between a third reflection surface (M3) and a fourth reflection surface (M4). In accordance with a particular shape of the third reflection surface or with particular disposition, high-precision projection is ensured without enlargement in size of the whole system.

公开(公告)号：EP1482368A3

公开(公告)日：2006-05-10

申请号：EP04012646.8

申请日：2004-05-27

申请人： CANON KABUSHIKI KAISHA

发明人： Suzuki, Masayuki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/709 ,  G03F7/70258 ,  G03F9/7003

摘要： An exposure apparatus includes an illumination optical system (20) for illuminating a pattern formed on an object (R) with light from a light source (10), a projection optical system (30) for projecting, onto a plate (W), an image of a pattern illuminated by the illumination optical system, the projection optical system including a mirror (M1-M6), and a detection system (1a,3a,4a) for detecting a positional offset of the image of the pattern.

公开(公告)号：EP1418467A3

公开(公告)日：2005-11-23

申请号：EP03025299.3

申请日：2003-11-06

申请人： CANON KABUSHIKI KAISHA

发明人： Suzuki, Masayuki

IPC分类号： G03F7/20 ,  G02B17/06

CPC分类号： G03F7/70233 ,  G02B17/0657

摘要： Disclosed is a projection optical system specifically to be used with extreme ultraviolet (EUV) light having a wavelength not less than 10 nm and not greater than 20 nm. The projection optical system has six mirrors sequentially reflecting light in an order from the object side toward the image side and being disposed to define a coaxial system, wherein each of the six mirrors has a curvature radius not greater than 1500 mm.

公开(公告)号：EP1471389A2

公开(公告)日：2004-10-27

申请号：EP04252392.8

申请日：2004-04-23

申请人： CANON KABUSHIKI KAISHA

发明人： Sasaki, Takahiro ,  Suzuki, Masayuki

IPC分类号： G03F7/20 ,  G02B17/06

CPC分类号： G03F7/70233 ,  G02B17/0657 ,  G03F7/70275

摘要： Disclosed is a projection optical system (100) for projecting a pattern of a mask placed on an object plane (MS), onto a substrate placed on an image plane (W). The projection optical system is arranged so that an intermediate image (MI) of the pattern formed on the mask, is formed between a third reflection surface (M3) and a fourth reflection surface (M4). In accordance with a particular shape of the third reflection surface or with particular disposition, high-precision projection is ensured without enlargement in size of the whole system.

摘要翻译： 公开了一种用于将放置在物平面（MS）上的掩模的图案投影到放置在图像平面（W）上的基板上的投影光学系统（100）。 投影光学系统被布置为使得在第三反射表面（M3）和第四反射表面（M4）之间形成在掩模上形成的图案的中间图像（MI）。 根据第三反射面的特定形状或特定布置，确保高精度投影而不会使整个系统的尺寸增大。

公开(公告)号：EP0947882A3

公开(公告)日：1999-10-13

申请号：EP99201981.0

申请日：1987-07-08

申请人： CANON KABUSHIKI KAISHA

发明人： Suzuki, Masayuki ,  Mochizuki, Noritaka ,  Minami, Setsuo ,  Ogura, Shigetaro ,  Fukuda, Yasuaki ,  Watanabe, Yutaka ,  Kawai, Yasuo ,  Kariya, Takao

IPC分类号： G03F7/20

CPC分类号： B82Y10/00 ,  G02B17/0636 ,  G03F7/2039 ,  G03F7/70033 ,  G03F7/70233 ,  G03F7/7025 ,  G03F7/70691 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70883 ,  G03F7/70891

摘要： An X-ray exposure apparatus includes a stage (1) for holding a reflection type mask (MS) having a multilayered reflection pattern for circuit manufacturing, a stage (50) for holding a wafer (WF) to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing a plurality of curved reflecting mirrors (M1, M2, M3) coated with multilayer films, for receiving X-rays from a mask (MS) and directing them to a wafer (WF) to expose the wafer to the pattern of the mask with the X-rays in a reduced scale.

摘要翻译： 一种X射线曝光设备包括：用于保持具有用于电路制造的多层反射图案的反射型掩模（MS）的台（1）;用于保持晶片（WF）以暴露于 具有X射线的掩模和反射缩减成像系统，所述反射缩减成像系统设置在所述掩模台和所述晶片台之间，所述反射缩减成像系统包括反射镜装置，所述反射镜装置包含涂覆有多层膜的多个弯曲反射镜（M1，M2，M3） 来自掩模（MS）的X射线并将它们引导至晶圆（WF），以便以减小的比例将晶圆暴露于具有X射线的掩模图案。

公开(公告)号：EP0279670B1

公开(公告)日：1997-10-29

申请号：EP88301367.4

申请日：1988-02-18

申请人： CANON KABUSHIKI KAISHA

发明人： Ikeda, Tsutomu ,  Watanabe, Yutaka ,  Suzuki, Masayuki ,  Hayashida, Masami ,  Fukuda, Yasuaki ,  Ogura, Shigetaro ,  Iizuka, Takashi ,  Niibe, Masahito

IPC分类号： G03F1/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/58 ,  G03F7/70033 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70875 ,  G03F7/70958