公开(公告)号：EP1930886A1

公开(公告)日：2008-06-11

申请号：EP06781570.4

申请日：2006-07-25

申请人： Fujifilm Corporation

发明人： USAMI, Yoshihisa

IPC分类号： G11B7/0065 ,  G11B7/007 ,  G11B7/085 ,  G11B7/09

CPC分类号： G11B7/0065 ,  G03H1/30 ,  G11B7/00781 ,  G11B7/083 ,  G11B7/24044 ,  G11B7/245 ,  G11B7/252 ,  G11B7/2585

摘要： The present invention aims to provide an optical recording method etc. that provides higher efficiency of recording and reproducing and is uninfluenced by the mismatch of optical axes of plural laser lights induced from accident errors of optical recording and optical reproducing apparatuses when carrying out recording or reproducing, or focus control etc. by use of a laser light, high multiple-recording can be carried out, and layer construction of the recording medium itself is simple.
For the purpose, an optical recording method etc. is provided that comprises a first step of recording an interference image, in which a recording light is irradiated at an optional focusing length X1 in thickness direction of the recording layer, an interference image is formed, and the interference image is formed on the recording layer, then multiple bits are recorded per one recording, and a second step of recording an interference image, in which the recording light is irradiated at a focusing length X2 that is different from the focusing length X1 to form a second interference image, and the second interference image is formed and recorded on the recording layer, and then multiple bits are recorded per one recording.

摘要翻译： 本发明旨在提供给光记录方法等没有提供记录和再现的更高的效率，并通过从光记录的意外错误和光学装置引起的多个激光光轴的再现当进行记录或再生的失配不受影响 或聚焦控制等通过使用激光光的，高多重记录，可以进行，并且记录介质本身的层结构是简单的。 为目的，向光记录方法等提供确实包括干涉图像的记录，其中一个记录光中的干扰的图像记录层的厚度方向的照射在可选的聚焦长度X 1形成的第一步骤， 和干扰图像记录层，那么多个比特被每一个记录记录，并且干涉图像，其中，所述记录光以聚焦长度X2照射所做的记录的第二步骤形成是从聚焦长度X1不同 以形成第二干涉图像，所述第二干涉图像被记录在记录和形成的层，然后多个比特被每一个记录记录。

公开(公告)号：EP1801792A1

公开(公告)日：2007-06-27

申请号：EP05793168.5

申请日：2005-10-13

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： G11B7/0045 ,  G11B7/0055 ,  G11B20/10

CPC分类号： G11B20/00688 ,  G11B20/00086 ,  G11B2220/218

摘要： A method and apparatus for moving copy-once contents to a different recording medium, making it impossible to reproduce information on a write-once recording medium. When copy-once contents recorded on a write-once recording medium are moved to a recording medium which is different from the write-once recording medium, a signal different from that recorded in an information recording area of the write-once recording medium is recorded in the information recording area, thereby making it impossible to reproduce information of the write-once recording medium.

公开(公告)号：EP2325676A1

公开(公告)日：2011-05-25

申请号：EP09809447.7

申请日：2009-06-03

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： G02B1/11 ,  G03F7/20 ,  H01L33/00 ,  B23K26/00 ,  B23K26/36

CPC分类号： G02B1/118 ,  B23K26/009 ,  B23K26/0622 ,  B23K26/0823 ,  B23K26/0869 ,  B23K26/18 ,  B23K26/36 ,  B23K26/364 ,  B23K26/40 ,  B23K2201/40 ,  B23K2203/50 ,  H01L33/22 ,  Y10T428/2457

摘要： There are provided a patterned member which has densely arranged pits on the surface and which is easily manufactured, and a method for manufacturing such a patterned member. A patterned member includes a substrate 10, a thermally deformable heat mode photoresist layer 20 provided on the substrate 10, pits 21 formed on the photoresist layer 20. The pits 21 are arranged in line along a plurality of tracks which are substantially parallel to one another, and as viewed in a direction along which the tracks Tn extend, each pit 21 on one track is positioned at a position corresponding to a midpoint between two adjacent pits arranged on an adjacent track.

摘要翻译： 提供了在表面上具有密集布置的凹坑并且易于制造的图案化构件，以及用于制造这种图案构件的方法。 图案化构件包括基板10，设置在基板10上的可热变形的热模式光致抗蚀剂层20，形成在光致抗蚀剂层20上的凹坑21.凹坑21沿着基本上彼此平行的多个轨道排成一行 ，并且沿着轨道Tn延伸的方向观察，一个轨道上的每个凹坑21位于对应于布置在相邻轨道上的两个相邻凹坑之间的中点的位置。

公开(公告)号：EP2270598A1

公开(公告)日：2011-01-05

申请号：EP09734419.6

申请日：2009-03-23

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/704 ,  G03F9/7026

摘要： A laser exposure method for performing exposure is provided in which a supporting stage (2) supporting a plurality of objects (workpieces 5) and a laser beam illumination device (3) illuminating the objects while a focus servo control based on reflected light is being effected are moved relative to each other. The method includes a control start step of starting the focus servo control when the laser beam has reached a focus start position (FS) on an object; a control stop step of stopping the focus servo control when the laser beam has reached a focus stop position (FE) on the object; and a retaining step of retaining a position of an optical component (objective lens 35) at a predetermined position for a period until the laser beam starting from the focus stop position (FE) on the object reaches a focus start position (FS) on a subsequent object.

摘要翻译： 提供了一种用于进行曝光的激光曝光方法，其中支持多个对象（工件5）的支撑台（2）和激光束照明装置（3）在基于反射光的聚焦伺服控制的同时对物体进行照明 相对于彼此移动。 该方法包括当激光束已经到达物体上的聚焦开始位置（FS）时开始聚焦伺服控制的控制开始步骤; 控制停止步骤，当所述激光束已到达所述物体上的聚焦停止位置（FE）时停止聚焦伺服控制; 以及保持步骤，将光学部件（物镜35）的位置保持在预定位置一段时间，直到从物体上的聚焦停止位置（FE）开始的激光束到达物体上的聚焦开始位置（FS） 后续对象。

公开(公告)号：EP2263846A1

公开(公告)日：2010-12-22

申请号：EP09720160.2

申请日：2009-03-04

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： B29C33/38 ,  B29C45/26 ,  G03F7/20 ,  G03F7/26 ,  G03F7/36 ,  G03F7/40 ,  B29L11/00

CPC分类号： G03F7/0002 ,  B29C33/3857 ,  B29C33/424 ,  B29C45/263 ,  B29L2011/0016 ,  B82Y10/00 ,  B82Y40/00

摘要： A processing method for a mold (1) to form a pattern of recessed portions (13) on a product forming surface (11) formed on the mold (1) includes a photoresist forming step in which a thermally deformable heat-mode photoresist layer (12) is formed on the product forming surface (11), a laser beam illumination step in which a laser beam is applied to the photoresist layer (12) by an exposure device incorporating a semiconductor laser to form a pattern of recessed portions (13), and an asperity forming step in which asperities are formed on the product forming surface (11) by making use of the pattern of recessed portions (13).

摘要翻译： 在形成在模具（1）上的产品形成表面（11）上形成凹部（13）图案的模具（1）的加工方法包括光致抗蚀剂形成步骤，其中可热变形的热模式光致抗蚀剂层 12）形成在产品形成表面（11）上，激光照射步骤通过包含半导体激光器的曝光装置将激光束施加到光致抗蚀剂层（12）上以形成凹陷部分（13）的图案， 以及通过利用凹部（13）的图案在产品形成表面（11）上形成凹凸的凹凸形成步骤。

公开(公告)号：EP2202742A1

公开(公告)日：2010-06-30

申请号：EP08840659.0

申请日：2008-10-07

申请人： Fujifilm Corporation

发明人： USAMI, Yoshihisa

IPC分类号： G11B7/26 ,  G03F7/20

CPC分类号： G11B7/261 ,  G11B7/246 ,  G11B7/2492 ,  G11B7/253

摘要： A recessed portion forming method for forming a plurality of recessed portions in a thermally deformable heat mode recording material layer is provided, which method includes: a recessed portion forming step of applying condensed light emitted from an optical system including a light source, to the recording material layer to form the recessed portions; an inspection light illumination step of applying inspection light to the recessed portions during or after formation of the recessed portions in the recording material layer; a detection step of detecting a light quantity of the inspection light reflected or diffracted from the recessed portions; and an output regulation step of regulating an output of the light source based upon the light quantity so that the light quantity becomes a predetermined value. Methods for manufacturing a pit-projection product, a light emitting element, and an optical element, using this method are also provided.

摘要翻译： 形成用于在可热变形的热模式记录材料层中形成凹部的多元性方法的凹部设置，该方法包括：凹部形成施加从光学系统包括：光源上发射的聚光的步骤，向记录 材料层以形成所述凹部; 到过程中或形成在记录材料层中的凹部之后施加检查光的凹部的检查光照射步骤; 检测反射或从凹部衍射的检查光的光量的检测步骤; 并且在基于该光量的光源的输出调整的输出调节步骤所以没有光量成为预定值。 因此，提供一种用于制造凹 - 凸制品，发光元件，以及光学元件，使用该方法的方法。

公开(公告)号：EP2135901A1

公开(公告)日：2009-12-23

申请号：EP08721374.0

申请日：2008-03-05

申请人： Fujifilm Corporation

发明人： WATANABE, Tetsuya ,  USAMI, Yoshihisa

IPC分类号： C09B23/00 ,  C09B29/48 ,  C09B45/14 ,  C09B45/18 ,  C09B45/20 ,  C09B45/48 ,  C09B47/12 ,  C09B47/18 ,  C09B47/20 ,  G03F7/004

CPC分类号： C09B69/06 ,  C09B23/0008 ,  C09B23/0016 ,  C09B23/005 ,  C09B23/0066 ,  C09B23/0091 ,  C09B23/04 ,  C09B23/06 ,  C09B23/083 ,  C09B23/086 ,  C09B23/102 ,  C09B23/107 ,  C09B29/0033 ,  C09B29/0037 ,  C09B29/004 ,  C09B29/0048 ,  C09B29/0066 ,  C09B29/0081 ,  C09B29/0088 ,  C09B29/0092 ,  C09B29/0803 ,  C09B29/081 ,  C09B29/083 ,  C09B29/12 ,  C09B29/26 ,  C09B29/325 ,  C09B29/337 ,  C09B29/338 ,  C09B29/3604 ,  C09B29/3608 ,  C09B29/3634 ,  C09B29/3652 ,  C09B29/366 ,  C09B29/3673 ,  C09B47/14 ,  C09B47/18 ,  C09B47/20 ,  C09B47/22 ,  C09B47/24 ,  C09B47/26 ,  C09B69/04 ,  G03F7/091 ,  G03F7/36

摘要： The present invention relates to a compound for photoresist, selected from the group consisting of a compound comprising an oxonol dye skeleton, a cyanine dye, a styryl dye, a compound comprising a merocyanine dye skeleton, a compound comprising a phthalocyanine dye skeleton, an azo compound, and a complex compound of an azo compound and a metal ion. The present invention further provides a photoresist liquid comprising at least one of the compound for photoresist and a method of etching a surface being processed using the photoresist liquid.

摘要翻译： 本发明涉及一种光致抗蚀剂化合物，其选自包含氧杂菁染料骨架，花青染料，苯乙烯基染料，包含部花青染料骨架的化合物，包含酞菁染料骨架的化合物，偶氮化合物 化合物和偶氮化合物和金属离子的络合物。 本发明还提供一种光致抗蚀剂液体，其包含至少一种用于光致抗蚀剂的化合物和蚀刻使用光致抗蚀剂液体处理的表面的方法。

公开(公告)号：EP2012198A1

公开(公告)日：2009-01-07

申请号：EP06834917.4

申请日：2006-12-18

申请人： Fujifilm Corporation

发明人： KAMO, Makoto ,  USAMI, Yoshihisa ,  SASAKI, Toshio

IPC分类号： G03H1/04 ,  G11B7/0065 ,  G11B7/135 ,  G11B7/24

CPC分类号： G11B7/00781 ,  G03H1/18 ,  G03H1/182 ,  G03H2223/14 ,  G11B7/0065 ,  G11B7/0938 ,  G11B7/1275 ,  G11B7/1392 ,  G11B7/24038 ,  G11B7/24044 ,  G11B7/26

摘要： The present invention is to provide a method for treating an optical recording medium including irradiating a recording layer, which has recorded information, with a treatment light through a light diffusion member having a haze of 70% to 100%, wherein the optical recording medium contains at least the recording layer which records information using holography, and a device for treating an optical recording medium containing a light source for the treatment light, and the light diffusion member having a haze of 70% to 100% and disposed between the light source and the optical recording medium, wherein the recording layer is irradiated with the treatment light through the light diffusion member from the light source. The preferred aspects are that a half width of wavelength for an energy intensity of the treatment light is 5 nm to 700 nm; and the optical recording medium is a write-once read-many optical recording medium.

摘要翻译： 本发明是提供一种用于通过光扩散构件治疗光记录介质，其包括照射记录层，其具有记录的信息上，与处理光具有70％的雾度为100％，worin光学记录介质包含提供一种方法 至少利用全息术记录了信息的记录层，和用于处理含用于治疗光的光源的光学记录介质上的装置，并且具有70％的光源之间的雾度为100％，设置在光扩散部件 光学记录介质，worin记录层通过从所述光源的光扩散部件照射治疗光。 在优选的方面做了波长的半宽度为在治疗光的能量强度为5nm至700nm; 和光学记录介质是一次写入多次读光记录介质。

公开(公告)号：EP1993005A1

公开(公告)日：2008-11-19

申请号：EP07714644.7

申请日：2007-02-21

申请人： FUJIFILM Corporation

发明人： USAMI, Yoshihisa

IPC分类号： G03H1/04 ,  G11B7/0045 ,  G11B7/0065 ,  G11B7/125 ,  G11B7/135 ,  G11B7/24

CPC分类号： G11B7/0065 ,  G03H1/26 ,  G03H2222/33 ,  G03H2240/52 ,  G11B7/0045 ,  G11B7/005 ,  G11B7/1275

摘要： The present invention provides an optical recording method including: recording information on a recording layer for holographically recording information in an optical recording medium by irradiating the optical recording medium with an information beam and a reference beam, and repetitively recording information on the recording layer while moving at least any one of the information beam and reference beam and the recording layer along the surface of the recording layer, thereby being capable of shift-multiplex recording operations, wherein the optical recording medium is irradiated on a recording pulse basis, the peak intensity of light of the recording pulse is 0.1 mW to 100 mW, the irradiation time is 0.05 nsec to 1 × 10 5 nsec, and the irradiation of recording pulse is performed 5 times to 1 × 10 7 times per 1 msec; and also provides an optical recording apparatus and an optical recording medium.

摘要翻译： 本发明提供一种光学记录方法，包括：记录信息的记录层上通过在信息光束和参考光束辐照所述光学记录介质，并重复地记录在记录层上的信息在光学记录介质全息记录信息，同时移动 至少所述信息光束和参考光束和沿记录层的表面上的记录层，由此能够移位复用记录操作，worin光学记录介质中的任何一个被照射在记录脉冲的基础上，峰值强度的 记录脉冲的光为0.1毫瓦至100毫瓦，照射时间是0:05纳秒到1×10 5纳秒，和记录脉冲的照射进行五次，以1×10 7次，每次1毫秒; 等提供的光记录装置和光记录介质。

公开(公告)号：EP3605303A1

公开(公告)日：2020-02-05

申请号：EP18776596.1

申请日：2018-02-09

申请人： FUJIFILM Corporation

发明人： OKABE, Yuki ,  TSUKAMOTO, Naoki ,  USAMI, Yoshihisa ,  KITAGAWA, Yusuke

IPC分类号： G06F3/0488 ,  G06F3/0354 ,  G06F3/041

摘要： A touch type operation system and an operation method and an operation program of the same capable of reducing inconvenience related to release of an operation lock of a touch sensor and execution of a function while preventing erroneous operations are provided.
A touchpad (13) includes a flat surface portion (40) and a protruding solid portion (41) having a hemispherical shape. The operation recognition part (75) recognizes a gesture operation performed on an operation region of the touchpad (13). An operation validity determination part (76) determines that only a rotating slide operation with respect to a lower periphery (41A) of the solid portion (41) is a valid operation even at a time of an operation lock invalidating the gesture operation. In a case where the rotating slide operation is performed at the time of the operation lock, the operation lock is released, and at the same time, a specific function is executed by an AP execution part (71).